Two-dimensional spatial profiles of plasma parameters in DC reactive magnetron sputtering of indium-tin-oxide

1999 ◽  
Vol 341 (1-2) ◽  
pp. 221-224 ◽  
Author(s):  
M. Muta ◽  
S. Ohgushi ◽  
Y. Matsuda ◽  
H. Fujiyama
Keyword(s):  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Reactive Magnetron Sputtering ◽  
Two Dimensional ◽  
Reactive Magnetron ◽  
Plasma Parameters ◽  
Dc Reactive Magnetron Sputtering

Relation between Plasma Parameters and Film Properties in DC Reactive Magnetron Sputtering of Indium-Tin-Oxide

1997 ◽  
Vol 36 (Part 1, No. 7B) ◽  
pp. 4922-4927 ◽  
Author(s):  
Yoshinobu Matsuda ◽  
Yasunari Yamori ◽  
Madoka Muta ◽  
Shinichi Ohgushi ◽  
Hiroshi Fujiyama
Keyword(s):  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Plasma Parameters ◽  
Film Properties ◽  
Dc Reactive Magnetron Sputtering

Reactive Magnetron Sputtering of Indium Tin Oxide on Acrylics

2001 ◽  
Vol 206-213 ◽  
pp. 507-510
Author(s):  
Jow Lay Huang ◽  
Bao-Shun Yau ◽  
Su Shia Lin ◽  
Ding-Fwu Lii
Keyword(s):  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron
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