Sputtering yields of boron bombarded by light ions

Vacuum ◽  
1980 ◽  
Vol 30 (1) ◽  
pp. 40
Keyword(s):  
1979 ◽  
Vol 19 (4) ◽  
pp. 421-426 ◽  
Author(s):  
H. L. Bay ◽  
J. Bohdansky

1978 ◽  
Vol 49 (12) ◽  
pp. 6194-6196 ◽  
Author(s):  
S. Miyagawa ◽  
Y. Ato ◽  
Y. Moriya
Keyword(s):  

1976 ◽  
Vol 63 ◽  
pp. 215-221 ◽  
Author(s):  
H. Von Seefeld ◽  
H. Schmidl ◽  
R. Behrisch ◽  
B.M.U. Scherzer

2021 ◽  
pp. 59-64
Author(s):  
Vladimir Manukhin

The paper presents an analytical model for sputtering two-component layered inhomogeneous targets by bombardment with light ions. An analytical formula is obtained that makes it possible to calculate the total and partial sputtering yields of a binary layer of target inhomogeneity by light ions. The obtained formula is used to calculate the sputtering yields of oxide layers from the surface of a homogeneous substrate. The calculation results are in good agreement with the computer simulation data.


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pp. 102004
Author(s):  
Christophe Champion ◽  
Mariel E Galassi ◽  
Philippe F Weck ◽  
Omar Fojón ◽  
Jocelyn Hanssen ◽  
...  

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