Coating electron microscopic specimens by sputtering yields particulary fine grained coatings of strong adherence. Two methods have been applied up to now. Their difference lies in the arrangement of target and specimen. If, in one case both, target and specimen are arranged inside the discharge chamber,damage by the discharge of sensitive specimens is possible (Fig.la). If, in the other case both, target and specimen are arranged outside the discharge chamber, focussing of the ions is necessary, above all for shadowing (Fig.lb).Simple ion guns of low energy (some keV) however, yield a relatively low ion current, so that coatings with materials which are difficult to sputter, such as tungsten, can hardly be produced. With ions of higher energy the gain of sputtering particles would certainly increase. However, the danger arises that ions scattered at the target and neutral particles of high energy could damage the specimen.The basic idea of the new sputter source consists of arranging the target inside the discharge chamber but the specimen outside of it (Fig.2).