Robust optimization for magnetic lens design

1999 ◽  
Vol 427 (1-2) ◽  
pp. 306-309 ◽  
Author(s):  
C.J Edgcombe ◽  
A.R Lupini ◽  
J.H Taylor
Keyword(s):  
Robust Optimization ◽  
Lens Design ◽  
Magnetic Lens

The Added Value of Graphical Input and Display for Electron Lens Design

1990 ◽  
Vol 48 (1) ◽  
pp. 190-191
Author(s):  
B. Lencova ◽  
G. Wisselink
Keyword(s):  
Flux Density ◽  
Numerical Data ◽  
Added Value ◽  
Lens Design ◽  
Step Size ◽  
Magnetic Lens ◽  
Flux Lines ◽  
Fine Mesh ◽  
Electron Lens ◽  
User Friendly

Recent progress in computer technology enables the calculation of lens fields and focal properties on commonly available computers such as IBM ATs. If we add to this the use of graphics, we greatly increase the applicability of design programs for electron lenses. Most programs for field computation are based on the finite element method (FEM). They are written in Fortran 77, so that they are easily transferred from PCs to larger machines.The design process has recently been made significantly more user friendly by adding input programs written in Turbo Pascal, which allows a flexible implementation of computer graphics. The input programs have not only menu driven input and modification of numerical data, but also graphics editing of the data. The input programs create files which are subsequently read by the Fortran programs. From the main menu of our magnetic lens design program, further options are chosen by using function keys or numbers. Some options (lens initialization and setting, fine mesh, current densities, etc.) open other menus where computation parameters can be set or numerical data can be entered with the help of a simple line editor. The "draw lens" option enables graphical editing of the mesh - see fig. I. The geometry of the electron lens is specified in terms of coordinates and indices of a coarse quadrilateral mesh. In this mesh, the fine mesh with smoothly changing step size is calculated by an automeshing procedure. The options shown in fig. 1 allow modification of the number of coarse mesh lines, change of coordinates of mesh points or lines, and specification of lens parts. Interactive and graphical modification of the fine mesh can be called from the fine mesh menu. Finally, the lens computation can be called. Our FEM program allows up to 8000 mesh points on an AT computer. Another menu allows the display of computed results stored in output files and graphical display of axial flux density, flux density in magnetic parts, and the flux lines in magnetic lenses - see fig. 2. A series of several lens excitations with user specified or default magnetization curves can be calculated and displayed in one session.

On the magnetic electron lens of minimum sphrical aberration

1978 ◽  
Vol 36 (1) ◽  
pp. 24-25
Author(s):  
S. Suzuki ◽  
A. Ishikawa
Keyword(s):  
Spherical Aberration ◽  
Resolving Power ◽  
Objective Lens ◽  
Lens Design ◽  
Magnetic Lens ◽  
Initial Voltage ◽  
Path Distance ◽  
Electron Lens ◽  
Image Position ◽  
Magnetic Electron

For the development of the electron microscope, in which high resolving power is demanded, it is important to construct an electron objective lens with minimum spherical aberration.In 1943, one of the authors published the paper on the approximate calculation of the electromagnetic field to give a minimum spherical aberration and also published the papers on small spherical aberration lens design based on this calculation.We will speak a comparison between the experimental results and the numerical calculations in practical cases.The following line shows the method to get more strictly minimum spherical aberration of magnetic lens.In a space charge free electron optical system, where a pure magnetic lens is concerned, differential equation for paraxial electron path is given byU being the initial voltage applied to the electron beam and γ the path distance from the optical axis Z.

Gapless Single-Pole Magnetic Lens for Low-Voltage SEM

1996 ◽  
Vol 54 ◽  
pp. 434-435
Author(s):  
F.C. Tsai ◽  
A.V. Crewe
Keyword(s):  
Cross Section ◽  
Heat Dissipation ◽  
Magnetic Circuit ◽  
Low Voltage ◽  
Strong Field ◽  
Lens Design ◽  
Pole Piece ◽  
High Permeability ◽  
Magnetic Lens ◽  
Magnetomotive Force

An unconventional single pole lens design has attracted attention because it promises a highly confined strong field distribution which in turns results in smaller third aberrations than that of the conventional lenses. However in this type of lens heat dissipation becomes crucial. In the low electron energy range (less than 5 KV), however, we can keep all the benefits from the single pole piece without being concerned about the cooling requirement.The key to the design is to avoid the unnecessary strong fields in any region away from the axis, which can absorb a lot of applied magnetomotive force (MMF) if this off-axis region happens to be in the air. This implies that a reasonable design is a gapless geometry. In our design (Fig. 1), a hemisphere tip sits on the top of a central pole. At the rim between the boundary of the central tapered pole and the tip is a 45° semi-angle funnel-shaped exterior pole. These three parts physically contact each other and form a gapless geometry. The central and exterior poles also contact each other at the bottom of the lens to form the high permeability magnetic circuit loop. The cross section of each part of the lens has been chosen in such a way that the region close to the tip will saturate first.

Modular Magnetic Lens Accessory to Basic Field Emission SEM

1973 ◽  
Vol 31 ◽  
pp. 246-247
Author(s):  
Duane C. Holmes ◽  
James H. Cooper ◽  
James J. Gold ◽  
L. M. Welter
Keyword(s):  
Field Emission ◽  
Short Exposure ◽  
High Signal ◽  
Lens Design ◽  
Magnetic Lens ◽  
Basic Field ◽  
High Brightness ◽  
Electrostatic Lens ◽  
Heated Filament ◽  
Very High

It is well known that field emission produces a significantly brighter probe than conventional heated-filament methods. Heretofore, however, the only commercially available field emission SEM exploited this brightness advantage to permit TV rate scanning at all magnifications; the viewing of large, bright, “flicker free” and “stripe-free” images; and lownoise photography at short exposure times. A resolution of 250 Å, in secondary mode, was obtained using an electrostatic lens design. The high brightness may also be exploited to yield very high resolution and/or high signal to noise images.

Resolution Attainable With the Present Day STEM

1973 ◽  
Vol 31 ◽  
pp. 230-231 ◽  
Author(s):  
J. S. Wall ◽  
J. P. Langmore ◽  
H. Isaacson ◽  
A. V. Crewe
Keyword(s):  
Spherical Aberration ◽  
Focal Length ◽  
Incident Beam ◽  
Scanning Transmission Electron Microscope ◽  
Aperture Size ◽  
Magnetic Lens ◽  
Peak Intensity ◽  
Transmission Electron ◽  
Scanning Transmission ◽  
Half Angle

The scanning transmission electron microscope (STEM) constructed by the authors employs a field emission gun and a 1.15 mm focal length magnetic lens to produce a probe on the specimen. The aperture size is chosen to allow one wavelength of spherical aberration at the edge of the objective aperture. Under these conditions the profile of the focused spot is expected to be similar to an Airy intensity distribution with the first zero at the same point but with a peak intensity 80 per cent of that which would be obtained If the lens had no aberration. This condition is attained when the half angle that the incident beam subtends at the specimen, 𝛂 = (4𝛌/Cs)¼

Structure images of Si, Ge and Mos2 crystals and some application to radiation damage studies

1978 ◽  
Vol 36 (1) ◽  
pp. 292-293 ◽  
Author(s):  
K. Izui ◽  
T. Nishida ◽  
S. Furuno ◽  
H. Otsu ◽  
S. Kuwabara
Keyword(s):  
Radiation Damage ◽  
Exposure Time ◽  
Gaussian Distribution ◽  
Intensity Distribution ◽  
Chromatic Aberration ◽  
Magnetic Lens

Recently we have observed the structure images of silicon in the (110), (111) and (100) projection respectively, and then examined the optimum defocus and thickness ranges for the formation of such images on the basis of calculations of image contrasts using the n-slice theory. The present paper reports the effects of a chromatic aberration and a slight misorientation on the images, and also presents some applications of structure images of Si, Ge and MoS2 to the radiation damage studies.(1) Effect of a chromatic aberration and slight misorientation: There is an inevitable fluctuation in the amount of defocus due to a chromatic aberration originating from the fluctuations both in the energies of electrons and in the magnetic lens current. The actual image is a results of superposition of those fluctuated images during the exposure time. Assuming the Gaussian distribution for defocus, Δf around the optimum defocus value Δf0, the intensity distribution, I(x,y) in the image formed by this fluctuation is given by

A High Resolution Scanning Microscope

1968 ◽  
Vol 26 ◽  
pp. 356-357
Author(s):  
A. V. Crewe ◽  
J. Wall ◽  
L. M. Welter
Keyword(s):  
High Resolution ◽  
Field Emission ◽  
Spherical Aberration ◽  
Focal Length ◽  
Spot Size ◽  
Emission Source ◽  
Field Of View ◽  
Scanning Microscope ◽  
Magnetic Lens ◽  
High Quality

A scanning microscope using a field emission source has been described elsewhere. This microscope has now been improved by replacing the single magnetic lens with a high quality lens of the type described by Ruska. This lens has a focal length of 1 mm and a spherical aberration coefficient of 0.5 mm. The final spot size, and therefore the microscope resolution, is limited by the aberration of this lens to about 6 Å.The lens has been constructed very carefully, maintaining a tolerance of + 1 μ on all critical surfaces. The gun is prealigned on the lens to form a compact unit. The only mechanical adjustments are those which control the specimen and the tip positions. The microscope can be used in two modes. With the lens off and the gun focused on the specimen, the resolution is 250 Å over an undistorted field of view of 2 mm. With the lens on,the resolution is 20 Å or better over a field of view of 40 microns. The magnification can be accurately varied by attenuating the raster current.

Recent developments in automated Transmission Electron MI

1989 ◽  
Vol 47 ◽  
pp. 46-47
Author(s):  
W.J. de Ruijter ◽  
P. Rez ◽  
David J. Smith
Keyword(s):  
Image Analysis ◽  
Computer Image ◽  
Lens Design ◽  
Computer Image Analysis ◽  
Transmission Electron ◽  
Resolution Electron ◽  
Recent Developments ◽  
On Line ◽  
Routine Procedures ◽  
Near Future

There is growing interest in the on-line use of computers in high-resolution electron n which should reduce the demands on highly skilled operators and thereby extend the r of the technique. An on-line computer could obviously perform routine procedures hand, or else facilitate automation of various restoration, reconstruction and enhan These techniques are slow and cumbersome at present because of the need for cai micrographs and off-line processing. In low resolution microscopy (most biologic; primary incentive for automation and computer image analysis is to create a instrument, with standard programmed procedures. In HREM (materials researc computer image analysis should lead to better utilization of the microscope. Instru (improved lens design and higher accelerating voltages) have improved the interpretab the level of atomic dimensions (approximately 1.6 Å) and instrumental resolutior should become feasible in the near future.

Performance and applications of the holography electron microscope

1993 ◽  
Vol 51 ◽  
pp. 1078-1079
Author(s):  
Akira Tonomura
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Phase Measurement ◽  
Electron Holography ◽  
Imaging Method ◽  
High Contrast ◽  
Magnetic Lens ◽  
High Brightness ◽  
Holographic Imaging ◽  
Dynamic Observation

Electron holography is a two-step imaging method. However, the ultimate performance of holographic imaging is mainly determined by the brightness of the electron beam used in the hologram-formation process. In our 350kV holography electron microscope (see Fig. 1), the decrease in the inherently high brightness of field-emitted electrons is minimized by superposing a magnetic lens in the gun, for a resulting value of 2 × 109 A/cm2 sr. This high brightness has lead to the following distinguished features. The minimum spacing (d) of carrier fringes is d = 0.09 Å, thus allowing a reconstructed image with a resolution, at least in principle, as high as 3d=0.3 Å. The precision in phase measurement can be as high as 2π/100, since the position of fringes can be known precisely from a high-contrast hologram formed under highly collimated illumination. Dynamic observation becomes possible because the current density is high.

The Possibilities for Analytical Methods in Photoemission and Low-Energy Electron Microscopy

1990 ◽  
Vol 48 (1) ◽  
pp. 348-349
Author(s):  
Ernst Bauer
Keyword(s):  
Chemical Characterization ◽  
Emission Angle ◽  
Relative Energy ◽  
Objective Lens ◽  
Chemical Information ◽  
Magnetic Lens ◽  
Incident Intensity ◽  
X Ray ◽  
Leed Pattern ◽  
Image Position

One of the major shortcomings of conventional PEEM and of LEEM is the lack of chemical information about the surface. Although the imaging of the LEED pattern in the back focal plane of the objective lens of a LEEM instrument allows chemical characterization via the crystalline structure derived from the LEED pattern, this method fails in the absence of a characteristic LEED pattern. Direct information about the atomic composition of the surface is then needed which can be best obtained from inner shell electrons either directly by x-ray-induced photoemission (XPEEM) or by x-ray- or electron-induced Auger electron emission (AEEM). These modes of excitation and imaging can be combined with conventional PEEM and LEEM in one instrument which is presently being developed. Thus a complete structural and chemical characterization becomes possible in one instrument, with parallel detection and high resolution.In contrast to LEEM, in which up to more than 50% of the incident intensity is available for image formation, the intensity of the emitted electrons is much lower in XPEEM and AEEM and the signal is much lower than the background in AEEM. Therefore, intensity I and resolution d have to be optimized simultaneously which is best done by maximizing Q = I/d2 with respect to maximum emission angle α and relative energy distribution ε = ΔVo/V accepted by the instrument. For a well-designed magnetic lens section of the cathode lens its aberrations are determined by the accelerating field F in front of the specimen. For a homogeneous accelerating field F and a cosine emission distribution one obtains for the optimum α and ε values αo,εo a radius of the minimum disc of confusion of

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