Structure and corrosion behavior of (Ti, Fe, C) films co-deposited by three metal vapor vacuum arc beams

2000 ◽  
Vol 128-129 ◽  
pp. 209-212 ◽  
Author(s):  
Hong Liang ◽  
Furong Ma ◽  
Xiaoyan Wang ◽  
Tonghe Zhang ◽  
Hong Zhu ◽  
...  
Keyword(s):  
Corrosion Behavior ◽  
Metal Vapor ◽  
Vacuum Arc

Corrosion behavior of Zr modified CrN coatings using metal vapor vacuum arc ion implantation

2007 ◽  
Vol 25 (1) ◽  
pp. 110-116 ◽  
Author(s):  
K. P. Purushotham ◽  
L. P. Ward ◽  
N. Brack ◽  
P. J. Pigram ◽  
P. Evans ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Corrosion Behavior ◽  
Metal Vapor ◽  
Vacuum Arc ◽  
Crn Coatings

Corrosion behavior of a new 25Cr-3Ni-7Mn-0.66 N duplex stainless steel in artificial seawater

2021 ◽  
Vol 63 (6) ◽  
pp. 505-511
Author(s):  
Songkran Vongsilathai ◽  
Anchaleeporn Waritswat Lothongkum ◽  
Gobboon Lothongkum
Keyword(s):  
Stainless Steel ◽  
Duplex Stainless Steel ◽  
Passive Film ◽  
Corrosion Behavior ◽  
Electrochemical Impedance ◽  
Melting Furnace ◽  
Artificial Seawater ◽  
Vacuum Arc ◽  
Significant Difference ◽  
Type Semiconductor

Abstract A new duplex 25Cr-3Ni-7Mn-0.66 N alloy was prepared in a vacuum arc re-melting furnace and characterized by metallographic and EPMA methods. Its corrosion behavior was investigated by potentiodynamic polarization, electrochemical impedance spectroscopy (EIS) and a Mott-Schottky (M-S) analysis in artificial seawater at room temperature and compared with those of super and normal commercial duplex stainless steel (SDSS and DSS). No significant difference in the open circuit potentials and pitting potentials was observed. Its passive film current density lies between those of SDSS and DSS. This was confirmed by EIS analysis. A pit attack was observed on the δ-phase for all duplex samples, because the PREN16 of the δ-phase was lower than that of the γ-phase. From the Mott-Schottky analysis, the passive films were found to be composed of bi-layer structures, a p-type semiconductor inner layer, and a n-type semiconductor outer layer. The degree of defect as well as the effect of nitrogen in passive film layer are discussed with respect to the point defect model.

Performance of a high‐current metal vapor vacuum arc ion source

1990 ◽  
Vol 61 (12) ◽  
pp. 3775-3782 ◽  
Author(s):  
Hiroshi Shiraishi ◽  
Ian G. Brown
Keyword(s):  
Metal Vapor ◽  
Ion Source ◽  
Vacuum Arc ◽  
High Current

Study on the Dopedβ-FeSi 2 Obtained by Metal Vapor Vacuum Arc Ion Source Implantation and Post-Annealing

2002 ◽  
Vol 730 ◽  
Author(s):  
Shuangbao Wang ◽  
Hong Liang ◽  
Peiran Zhu
Keyword(s):  
Metal Vapor ◽  
Ion Source ◽  
Vacuum Arc ◽  
Post Annealing ◽  
Strong Current ◽  
Xrd Patterns ◽  
Fe Ions

Abstractβ-FeSi2 was firstly formed by implanting Si wafers with Fe ions at 50 kV to a dose of 5×1017/cm2in a strong current Metal Vapor Vacuum Arc (MEVVA) implanter. Secondly, Ti implantation was performed on these Fe as-implanted samples. The Fe + Ti implanted samples were furnace annealed in vacuum at temperatures ranging from 650 to 975°C. The XRD patterns of the annealed samples correspond to β-FeSi2 structure (namely β-Fe(Ti)Si2). When annealing was done above 1050°C, the β-Fe(Ti)Si2 transformed into α-Fe(Ti)Si2. This implies that introducing Ti stabilizes the β-FeSi2 phase. Resistance measurements were also performed.

Influence of CuCr electrode composition on 2D electron and metal vapor density distribution over vacuum arc

2020 ◽  
Vol 53 (30) ◽  
pp. 305201 ◽  
Author(s):  
Yuki Inada ◽  
Ryo Kikuchi ◽  
Hiroyuki Nagai ◽  
Akiko Kumada ◽  
Kunihiko Hidaka ◽  
...  
Keyword(s):  
Density Distribution ◽  
Metal Vapor ◽  
Vacuum Arc ◽  
Vapor Density ◽  
Electrode Composition
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