Effect of substrate preparation and deposition conditions on the preferred orientation of TiN coatings deposited by RF reactive sputtering

A laser beam profilometry technique was used to investigate residual stress accumulation during TiN deposition and stress relaxation during post-deposition heat treatment. The test coatings were reactively sputtered on silicon and steel substrates using a UMS technique. TiN coatings, deposited at different bias and pressure levels, were evaluated for residual stress and microhardness. It was found that both the residual stress and the hardness were strongly affected by the coating deposition conditions. In addition, stress-temperature correlations were obtained by subjecting the coatings to temperature cycles up to 450°C. Stress-temperature plots revealed that the level of residual stress relaxation depended on deposition conditions and only coatings deposited at low ion bombardment could be fully annealed. The role of intrinsic and thermal stresses in the total residual stress in the coating/substrate system was also discussed.

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Intrinsic stress and preferred orientation in TiN coatings deposited on Al using plasma immersion ion implantation assisted deposition

Thin Solid Films ◽

10.1016/j.tsf.2003.08.065 ◽

2003 ◽

Vol 445 (1) ◽

pp. 48-53 ◽

Cited By ~ 21

Author(s):

S. Mukherjee ◽

F. Prokert ◽

E. Richter ◽

W. Möller

Keyword(s):

Ion Implantation ◽

Preferred Orientation ◽

Intrinsic Stress ◽

Tin Coatings ◽

Plasma Immersion Ion Implantation

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Effect of Deposition Conditions on the Structure and Properties of CrAlN Films Prepared by Pulsed DC Reactive Sputtering in FTS Mode at High Al Content

MATERIALS TRANSACTIONS ◽

10.2320/matertrans.mra2008604 ◽

2008 ◽

Vol 49 (9) ◽

pp. 2082-2090 ◽

Cited By ~ 11

Author(s):

Sara Khamseh ◽

Masateru Nose ◽

Tokimasa Kawabata ◽

Atsushi Saiki ◽

Kenji Matsuda ◽

...

Keyword(s):

Reactive Sputtering ◽

Structure And Properties ◽

Al Content ◽

Pulsed Dc ◽

High Al Content ◽

Deposition Conditions

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TiC and TiN coatings by reactive sputtering for fusion applications

Thin Solid Films ◽

10.1016/0040-6090(83)90120-7 ◽

1983 ◽

Vol 108 (4) ◽

pp. 395-400 ◽

Cited By ~ 14

Author(s):

Toshiro Yamashina ◽

Hiroshi Aida ◽

Osamu Kawamoto ◽

Masaaki Suzuki

Keyword(s):

Reactive Sputtering ◽

Tin Coatings ◽

Fusion Applications

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Corrosion and Soldering Behaviour of STD61 Coated by Arc Ion Plating Coatings

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.813.39 ◽

2013 ◽

Vol 813 ◽

pp. 39-42

Author(s):

Se Weon Choi ◽

Young Chan Kim ◽

Cheol Woo Kim ◽

Jae Ik Cho ◽

Chang Seog Kang

Keyword(s):

Texture Coefficient ◽

Preferred Orientation ◽

X Ray Diffraction ◽

Arc Ion Plating ◽

Ion Plating ◽

Tin Coatings ◽

Molten Aluminum Alloy ◽

Steel Cast ◽

Superior Corrosion Resistance ◽

Type Crystal

In order to investigate corrosion and soldering behaviour of STD61, TiN and TiAlN were coated on the surface of STD61 by using Arc Ion Plating. The structure of the coatings was examined as a function of deposition conditions by X-ray diffraction, and the crystallographic orientation was determined by use of a texture coefficient. TiN coating was grown with a strong (111) preferred orientation of a typical NaCl-type crystal structure. This strong (111) preferred orientation had been commonly observed from the TiN coatings deposited by physical vapour deposition techniques. TiAlN coatings, however, showed relatively multiple orientations mainly of (111) and (200). Furthermore, TiAlN film demonstrated superior corrosion resistance in a molten aluminum alloy at 680°C. This paper described in detail the corrosion and mass loss phenomena related to this steel-cast metal interaction.

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Influence of the deposition conditions of SnO2 thin films by reactive sputtering on the sensitivity to urban pollutants

Sensors and Actuators B Chemical ◽

10.1016/s0925-4005(97)00293-1 ◽

1997 ◽

Vol 45 (3) ◽

pp. 193-198 ◽

Cited By ~ 29

Author(s):

M.C Horrillo ◽

P Serrini ◽

J Santos ◽

L Manes

Keyword(s):

Thin Films ◽

Reactive Sputtering ◽

Urban Pollutants ◽

Sno2 Thin Films ◽

Deposition Conditions

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INFLUENCE OF Cu CONTENT ON PREFERRED ORIENTATION AND PROPERTIES OF CrCuN COATINGS

Surface Review and Letters ◽

10.1142/s0218625x19501130 ◽

2019 ◽

Vol 27 (03) ◽

pp. 1950113

Author(s):

SHUYONG TAN ◽

XUHAI ZHANG ◽

RUI ZHEN ◽

ZHANGZHONG WANG

Keyword(s):

Reactive Sputtering ◽

Preferred Orientation ◽

The Other ◽

Oriented Growth ◽

Cu Content ◽

Coating Hardness ◽

Pulsed Magnetron

CrCuN coatings were deposited using double target co sputtering by DC pulsed magnetron reactive sputtering. The Cu content increases from 0.7[Formula: see text]at.% to 5.5[Formula: see text]at.% with the increase of Cu target current from 0.08 to 0.24[Formula: see text]A. The influence of Cu content on preferred orientation and properties of CrCuN coatings was investigated. The results show that CrCuN coatings are mainly composed of CrN phase. Except for the coating containing 4.2[Formula: see text]at.% Cu, the other CrCuN coatings show CrN(111) preferred orientation. All the coatings have loose structure, which is chiefly responsible for unsatisfactory hardness. The oriented growth plays an important role in the change of coating hardness with Cu content.

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