The influence of magnetron configuration on ion current density and deposition rate in a dual unbalanced magnetron sputtering system

Surface and Coatings Technology ◽

10.1016/s0257-8972(98)00566-0 ◽

1998 ◽

Vol 108-109 ◽

pp. 317-322 ◽

Author(s):

P.J Kelly ◽

R.D Arnell

Keyword(s):

Magnetron Sputtering ◽

Deposition Rate ◽

Current Density ◽

Ion Current ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Ion Current Density ◽

Sputtering System

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High rate reactive sputtering in an opposed cathode closed-field unbalanced magnetron sputtering system

Surface and Coatings Technology ◽

10.1016/0257-8972(90)90080-v ◽

1990 ◽

Vol 43-44 ◽

pp. 270-278 ◽

Author(s):

William D. Sproul ◽

Paul J. Rudnik ◽

Michael E. Graham ◽

Suzanne L. Rohde

Keyword(s):

Magnetron Sputtering ◽

Reactive Sputtering ◽

High Rate ◽

Closed Field ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Sputtering System

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Plasma source based on an unbalanced magnetron sputtering system

Journal of Physics Conference Series ◽

10.1088/1742-6596/830/1/012057 ◽

2017 ◽

Vol 830 ◽

pp. 012057 ◽

Author(s):

D P Borisov ◽

V A Slabodchikov ◽

V M Kuznetsov

Keyword(s):

Magnetron Sputtering ◽

Plasma Source ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Sputtering System

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Investigation of plasma characteristics in an unbalanced magnetron sputtering system

Plasma Physics Reports ◽

10.1134/s1063780x09050055 ◽

2009 ◽

Vol 35 (5) ◽

pp. 399-408 ◽

Author(s):

A. A. Solov’ev ◽

N. S. Sochugov ◽

K. V. Oskomov ◽

S. V. Rabotkin

Keyword(s):

Magnetron Sputtering ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Plasma Characteristics ◽

Sputtering System

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Scratch response and tribological behaviour of CrAlNiN coatings deposited by closed field unbalanced magnetron sputtering system

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2019.03.053 ◽

2019 ◽

Vol 367 ◽

pp. 30-40 ◽

Author(s):

Chuhan Sha ◽

Zhifeng Zhou ◽

Zonghan Xie ◽

Paul Munroe

Keyword(s):

Magnetron Sputtering ◽

Closed Field ◽

Tribological Behaviour ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Sputtering System

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Effect of Duty Cycle and Frequency on the Ion Current Density on Substrate and Ion/Atom Ratio in Magnetron Sputtering of Aluminum

2020 7th International Congress on Energy Fluxes and Radiation Effects (EFRE) ◽

10.1109/efre47760.2020.9242064 ◽

2020 ◽

Author(s):

Vladimir Oskirko ◽

Andrey Solovyev ◽

Alexander Zakharov ◽

Vyacheslav Semenov ◽

Artem Pavlov

Keyword(s):

Magnetron Sputtering ◽

Current Density ◽

Ion Current ◽

Ion Current Density

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Double unbalanced magnetron sputtering system used for ion-assisted thin film deposition

Vacuum ◽

10.1016/s0042-207x(98)00144-4 ◽

1998 ◽

Vol 51 (2) ◽

pp. 119-126 ◽

Author(s):

S Groudeva-Zotova

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Thin Film Deposition ◽

Film Deposition ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Sputtering System

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A new semi-analytical method analyzing the magnetic field in unbalanced magnetron sputtering system

Vacuum ◽

10.1016/j.vacuum.2009.04.040 ◽

2009 ◽

Vol 83 (11) ◽

pp. 1317-1320

Author(s):

Liang Han ◽

YuQing Zhao ◽

YanWu Wang

Keyword(s):

Magnetic Field ◽

Magnetron Sputtering ◽

Analytical Method ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

The Magnetic Field ◽

Sputtering System

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Effect of DC bias voltage on the deposition rate for Ni thin films by RF–DC coupled unbalanced-magnetron sputtering

Surface and Coatings Technology ◽

10.1016/s0257-8972(00)00945-2 ◽

2000 ◽

Vol 133-134 ◽

pp. 295-300 ◽

Author(s):

Y. Mikami ◽

K. Yamada ◽

A. Ohnari ◽

T. Degawa ◽

T. Migita ◽

...

Keyword(s):

Magnetron Sputtering ◽

Deposition Rate ◽

Bias Voltage ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

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Development of a novel structure zone model relating to the closed-field unbalanced magnetron sputtering system

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581432 ◽

1998 ◽

Vol 16 (5) ◽

pp. 2858-2869 ◽

Author(s):

P. J. Kelly ◽

R. D. Arnell

Keyword(s):

Magnetron Sputtering ◽

Closed Field ◽

Unbalanced Magnetron Sputtering ◽

Novel Structure ◽

Unbalanced Magnetron ◽

Sputtering System

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The determination of the current-voltage characteristics of a closed-field unbalanced magnetron sputtering system

Surface and Coatings Technology ◽

10.1016/s0257-8972(97)00260-0 ◽

1998 ◽

Vol 98 (1-3) ◽

pp. 1370-1376 ◽

Author(s):

P.J. Kelly ◽

R.D. Arnell

Keyword(s):

Magnetron Sputtering ◽

Closed Field ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Current Voltage ◽

Current Voltage Characteristics ◽

Sputtering System

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