A new semi-analytical method analyzing the magnetic field in unbalanced magnetron sputtering system

Vacuum ◽

10.1016/j.vacuum.2009.04.040 ◽

2009 ◽

Vol 83 (11) ◽

pp. 1317-1320

Author(s):

Liang Han ◽

YuQing Zhao ◽

YanWu Wang

Keyword(s):

Magnetic Field ◽

Magnetron Sputtering ◽

Analytical Method ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

The Magnetic Field ◽

Sputtering System

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The research on half-analytical method in calculating the magnetic field of unbalanced magnetron sputtering

Acta Physica Sinica ◽

10.7498/aps.57.996 ◽

2008 ◽

Vol 57 (2) ◽

pp. 996

Author(s):

Han Liang ◽

Zhao Yu-Qing ◽

Zhang Hai-Bo

Keyword(s):

Magnetic Field ◽

Magnetron Sputtering ◽

Analytical Method ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

The Magnetic Field

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High rate reactive sputtering in an opposed cathode closed-field unbalanced magnetron sputtering system

Surface and Coatings Technology ◽

10.1016/0257-8972(90)90080-v ◽

1990 ◽

Vol 43-44 ◽

pp. 270-278 ◽

Author(s):

William D. Sproul ◽

Paul J. Rudnik ◽

Michael E. Graham ◽

Suzanne L. Rohde

Keyword(s):

Magnetron Sputtering ◽

Reactive Sputtering ◽

High Rate ◽

Closed Field ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Sputtering System

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Plasma source based on an unbalanced magnetron sputtering system

Journal of Physics Conference Series ◽

10.1088/1742-6596/830/1/012057 ◽

2017 ◽

Vol 830 ◽

pp. 012057 ◽

Author(s):

D P Borisov ◽

V A Slabodchikov ◽

V M Kuznetsov

Keyword(s):

Magnetron Sputtering ◽

Plasma Source ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Sputtering System

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Experimental Study of the Effect of Applied Magnetic Field on Plasma Properties of Unbalanced Magnetron Sputtering

Plasma Science and Technology ◽

10.1088/1009-0630/12/5/13 ◽

2010 ◽

Vol 12 (5) ◽

pp. 571-576 ◽

Author(s):

Mu Zongxin ◽

Wang Chun ◽

Mu Xiaodong ◽

Jia Li ◽

Liu Shengguang ◽

...

Keyword(s):

Magnetic Field ◽

Experimental Study ◽

Magnetron Sputtering ◽

Applied Magnetic Field ◽

Plasma Properties ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Investigation of plasma characteristics in an unbalanced magnetron sputtering system

Plasma Physics Reports ◽

10.1134/s1063780x09050055 ◽

2009 ◽

Vol 35 (5) ◽

pp. 399-408 ◽

Author(s):

A. A. Solov’ev ◽

N. S. Sochugov ◽

K. V. Oskomov ◽

S. V. Rabotkin

Keyword(s):

Magnetron Sputtering ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Plasma Characteristics ◽

Sputtering System

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Scratch response and tribological behaviour of CrAlNiN coatings deposited by closed field unbalanced magnetron sputtering system

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2019.03.053 ◽

2019 ◽

Vol 367 ◽

pp. 30-40 ◽

Author(s):

Chuhan Sha ◽

Zhifeng Zhou ◽

Zonghan Xie ◽

Paul Munroe

Keyword(s):

Magnetron Sputtering ◽

Closed Field ◽

Tribological Behaviour ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Sputtering System

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Double unbalanced magnetron sputtering system used for ion-assisted thin film deposition

Vacuum ◽

10.1016/s0042-207x(98)00144-4 ◽

1998 ◽

Vol 51 (2) ◽

pp. 119-126 ◽

Author(s):

S Groudeva-Zotova

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Thin Film Deposition ◽

Film Deposition ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Sputtering System

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The influence of the discharge current axial component on the magnetic field distribution in the cathode region of magnetron sputtering system

Journal of Physics Conference Series ◽

10.1088/1742-6596/872/1/012046 ◽

2017 ◽

Vol 872 ◽

pp. 012046

Author(s):

V D Goncharov ◽

K S Sorokin ◽

E M Fiskin

Keyword(s):

Magnetic Field ◽

Magnetron Sputtering ◽

Field Distribution ◽

Discharge Current ◽

Cathode Region ◽

Magnetic Field Distribution ◽

Axial Component ◽

The Magnetic Field ◽

Sputtering System

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Development of a novel structure zone model relating to the closed-field unbalanced magnetron sputtering system

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581432 ◽

1998 ◽

Vol 16 (5) ◽

pp. 2858-2869 ◽

Author(s):

P. J. Kelly ◽

R. D. Arnell

Keyword(s):

Magnetron Sputtering ◽

Closed Field ◽

Unbalanced Magnetron Sputtering ◽

Novel Structure ◽

Unbalanced Magnetron ◽

Sputtering System

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The determination of the current-voltage characteristics of a closed-field unbalanced magnetron sputtering system

Surface and Coatings Technology ◽

10.1016/s0257-8972(97)00260-0 ◽

1998 ◽

Vol 98 (1-3) ◽

pp. 1370-1376 ◽

Author(s):

P.J. Kelly ◽

R.D. Arnell

Keyword(s):

Magnetron Sputtering ◽

Closed Field ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Current Voltage ◽

Current Voltage Characteristics ◽

Sputtering System

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