Suppression of fluorescence interference via wavelength shift-keyed Raman spectroscopy using an argon ion laser and acousto-optic tunable filter

Author(s):  
C.M Stellman ◽  
F Bucholtz
1976 ◽  
Vol 30 (5) ◽  
pp. 542-544 ◽  
Author(s):  
Patricia L. Wancheck ◽  
Lynn E. Wolfram

A simple rapid method has been developed for the quantitative analysis of styrene monomer in butadiene/styrene latexes using Raman spectroscopy. The latex samples were sealed in capillary tubes and scanned under high resolution conditions using a Spex Ramalog 1401 with a Spectra Physics 2 W argon ion laser. The Raman method involves ratioing the olefinic C=C (1632 cm−1) band of styrene monomer to the trans 1:4 C=C (1668 cm−1) band of butadiene in the butadiene/styrene polymer. Typical samples were found to have as low an unreacted styrene concentration as 0.7 wt. %. Reproducibility between samples was found to be within 0.1%. The values of residual styrene obtained by the Raman technique agreed within 0.25% with those obtained by liquid chromatography.


1970 ◽  
Vol 3 (2) ◽  
Author(s):  
S. W. Harun , P. Poopalan and H. Ahmad

This paper reports and provides an explanation for the growth characteristics of fibre Bragg gratings (FBGs) fabricated  in high germania boron co-doped optical fiber by using a continuous wave (CW) doubled frequency Argon ion laser as an UV light source. The grating reflectivity and Bragg wavelength shift as a function of exposure time are measured. The index modulation time is observed to have a good fit to a power law of the form n = Ctb (t is the time, C and b are constants), whereas the exponent b of 0.3 is obtained for the FBGs. The UV laser light also causes a shift of the resonant wavelength with fabrication time. The fastest wavelength shift is shown to be 0.53 nm after 524 seconds exposure.Keywords: Fiber Bragg grating, Argon ion laser, Phase mask method, Growth characteristics.


Author(s):  
H.S. Mavi ◽  
S. Rath ◽  
Arun Shukla

Laser-induced etching of silicon is used to generate silicon nanocrystals. The pore structure depends on the substrate type and etching laser wavelength. Porous silicon (PS) samples prepared by Nd:YAG laser (1.16 eV) etching of n-type substrate showed a fairly uniform and highly interconnected network of nearly circular pores separated by thin columnar boundaries, while no circular pits were produced by argon- ion laser (2.41 eV) etching under similar conditions. The size and size distribution of the nanocrystals are investigated by Raman and photoluminescence spectroscopies and analyzed within the framework of quantum confinement models.


1972 ◽  
Vol 5 (10) ◽  
pp. 1807-1814 ◽  
Author(s):  
A Maitland ◽  
J C L Cornish
Keyword(s):  

1988 ◽  
Vol 8 (4) ◽  
pp. 3-9
Author(s):  
Norio MIYOSHI ◽  
Takahiro SEKI ◽  
Shuichi KINOSHITA ◽  
Takashi KUSHIDA ◽  
Tsuyoshi NISHIZAKA ◽  
...  

1982 ◽  
Vol 3 (1) ◽  
pp. 35-38
Author(s):  
Masatoshi Esaki ◽  
Hideo Hiratsuka ◽  
Mamoru Hiyama ◽  
Osamu Ueda ◽  
Yukio Toda ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document