Analysis of co-deposited Ti-Hf thin film on (0001)6H-SiC by HREM, energy-selected and hollow-cone images
Solid solution binary alloys are attractive for defect-free thin film semiconductor contacts because lattice matching can be obtained by composition adjustment, but chemical homogeneity is required. Highly composition sensitive energy-selected and hollow cone (HC) dark field imaging were evaluated for heterogeneity detection in Ti-Hf films using an Ω filter/Zeiss 912 TEM. Conventional HREM, which relatively insensitive to spatial composition variations in this case, was used to observe structural defects in the films near the interfaces.Thin films of pure Ti deposited via UHV electron beam evaporation at room temperature on n-type, vicinal (0001) 6H-SiC showed good epitaxy. This contact displayed rectifying characteristics. The interface was both structurally and chemically sharp. However, misfit dislocations at “stand off” positions were found, due to 4 % mismatch between the basal parameters of Ti and SiC. same column with Ti in the periodic table and has hexagonal crystal structure, but larger lattice parameter (aHf = 3.196 Å, and aTi = 2.950 Å). The Ti-Hf solid solution system obeys Vergard's law well, that is, the lattice parameters of this alloy change linearly with composition.