Characterization of the inverted tetrahedral twin particles in the heteroepitaxial KNbO3 thin films

1990 ◽  
Vol 48 (4) ◽  
pp. 466-467
Author(s):  
Shang H. Rou ◽  
John J. Hren ◽  
Philip D. Hren ◽  
Thomas M. Graettingcr ◽  
Michael S. Ameen ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Transmission Electron Microscopy ◽  
Diffraction Pattern ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Epitaxial Relationship ◽  
Target Holder ◽  
Transmission Electron ◽  
The Matrix

Perovskite potassium niobate (KNbO3) possesses good electrooptic properties for modulated channel waveguide applications, Epitaxial KNbO3 thin films were deposited onto (100) MgO substrates using an ion beam sputtering technique equipped with a novel computer-controlled rotating target holder , Conventional transmission electron microscopy (TEM) and high resolution transmission electron microscopy (HRTEM) were employed to perform defect structure and microstructure analysis. Special TEM sample preparation procedures have been developed, which will be reported elsewhere, Tetrahedral twin particles (TTP's) were observed in the epitaxial KNbO3 thin films. Since, the orientation difference between the TTP's and the matrix may affect the polarization switching properties, it is essential to understand their origin and eliminate them if possible.A selected area diffraction pattern of a KNbO3 thin film taken along the substrate (012) (figure 1) reveals twin and double diffraction spots. The mirror planes are determined to be of the {211} family. Figure 2(a) shows the electron diffraction pattern taken along the substrate (100). Twin spots coincide with some of the matrix spots indicating that the twin also maintains an epitaxial relationship with the MgO substrate. The orientation relationship between the twins and the matrix is [221]twin//[100]matrix.

Microstructure of polycrystalline near epitaxial (100) and (111) pyrochlore on A (100) MgO Substrate

1990 ◽  
Vol 48 (4) ◽  
pp. 1062-1063
Author(s):  
Shang Hsien Rou
Keyword(s):  
Thin Film ◽  
Electron Microscopy ◽  
Thin Films ◽  
Transmission Electron Microscopy ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Transmission Electron ◽  
Beam Sputtering ◽  
Physical Phenomena ◽  
Mgo Substrate

New and interesting physical phenomena are being observed via thin film depositions using a variety of processing techniques in different material systems. The present study describes Pb-Zr-Ti-O pyrochlore thin films which were deposited onto (100) MgO substrates using an ion beam sputtering technique. These films are of interest because of their unique microstructure which may provide valuable information in better understanding the epitaxial growth of thin films. Characterization were performed using conventional transmission electron microscopy (TEM) and high resolution transmission electron microscopy (HRTEM). Special TEM sample preparation procedures have been developed, which will be reported elsewhere.The as-deposited pyrochlore thin film is near epitaxial and is oriented with both (100) and (111) parallel to the (100) of the MgO substrate. Figure 1(a) shows the selected area diffraction pattern (SADP) of the pyrochlore thin film taken parallel to the [100] zone axis of the substrate.

Transmission Electron Microscopy studies of texture of Cr underlayer of magnetic recording hard disk

1991 ◽  
Vol 49 ◽  
pp. 580-581
Author(s):  
L. Tang ◽  
G. Thomas ◽  
M. R. Khan ◽  
S. L. Duan
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Transmission Electron Microscopy ◽  
Magnetic Recording ◽  
Magnetic Thin Films ◽  
Magnetic Films ◽  
Substrate Bias ◽  
Epitaxial Relationship ◽  
Transmission Electron

Cr thin films are often used as underlayers for Co alloy magnetic thin films, such as Co1, CoNi2, and CoNiCr3, for high density longitudinal magnetic recording. It is belived that the role of the Cr underlayer is to control the growth and texture of the Co alloy magnetic thin films, and, then, to increase the in plane coercivity of the films. Although many epitaxial relationship between the Cr underlayer and the magnetic films, such as ﹛1010﹜Co/ {110﹜Cr4, ﹛2110﹜Co/ ﹛001﹜Cr5, ﹛0002﹜Co/﹛110﹜Cr6, have been suggested and appear to be related to the Cr thickness, the texture of the Cr underlayer itself is still not understood very well. In this study, the texture of a 2000 Å thick Cr underlayer on Nip/Al substrate for thin films of (Co75Ni25)1-xTix dc-sputtered with - 200 V substrate bias is investigated by electron microscopy.

TEM Characterization of As-Deposited and Annealed Ni/Al Multilayer Thin Film

2010 ◽  
Vol 16 (6) ◽  
pp. 662-669 ◽  
Author(s):  
S. Simões ◽  
F. Viana ◽  
A.S. Ramos ◽  
M.T. Vieira ◽  
M.F. Vieira
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Transmission Electron Microscopy ◽  
Cross Section ◽  
Ion Beam ◽  
Microstructural Characterization ◽  
Multilayer Thin Films ◽  
Tem Analysis ◽  
Plan View ◽  
Transmission Electron

AbstractReactive multilayer thin films that undergo highly exothermic reactions are attractive choices for applications in ignition, propulsion, and joining systems. Ni/Al reactive multilayer thin films were deposited by dc magnetron sputtering with a period of 14 nm. The microstructure of the as-deposited and heat-treated Ni/Al multilayers was studied by transmission electron microscopy (TEM) and scanning transmission electron microscopy (STEM) in plan view and in cross section. The cross-section samples for TEM and STEM were prepared by focused ion beam lift-out technique. TEM analysis indicates that the as-deposited samples were composed of Ni and Al. High-resolution TEM images reveal the presence of NiAl in small localized regions. Microstructural characterization shows that heat treating at 450 and 700°C transforms the Ni/Al multilayered structure into equiaxed NiAl fine grains.

On the Oriented Growth and Optical Property of ZnO Thin Films Deposited on NaCl (001) Substrate by Ion Beam Sputtering

2010 ◽  
Vol 121-122 ◽  
pp. 52-57
Author(s):  
Shih Wei Mao ◽  
Jung Hsiung Shen ◽  
Der Shin Gan ◽  
Hsing Lu Huang ◽  
Sung Wei Yeh
Keyword(s):  
Thin Films ◽  
Room Temperature ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Temperature Dependent ◽  
Epitaxial Relationship ◽  
Oriented Growth ◽  
Transmission Electron ◽  
Beam Sputtering ◽  
High Resolution Tem

Temperature dependent oriented growth of ZnO thin film deposited on NaCl (001) substrates using ion beam sputtering was studied by transmission electron microscopy (TEM). Thin films showing a texture due to parallel epitaxy with NaCl (001) as deposited at 100 oC, whereas thin films deposited at 400 oC can form a texture. The microstructure and the epitaxial relationship with the NaCl (001) plane were studied by a high-resolution TEM. The possible causes for the orientation changed with temperature are discussed. The optical transparency of the nanofilms grown from room temperature to 400 oC was measured.

Epitaxial Growth of SrTiO3 Thin Films on TiN/Si Substrates Using RF Sputtering

2006 ◽  
Vol 966 ◽  
Author(s):  
Chun Wang ◽  
Mark H Kryder
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Transmission Electron Microscopy ◽  
High Resolution ◽  
Electron Diffraction ◽  
Electron Diffraction Pattern ◽  
Rf Sputtering ◽  
Epitaxial Relationship ◽  
Si Substrates ◽  
Transmission Electron

ABSTRACTEpitaxial SrTiO3 (001) thin films with a TiN template layer have been deposited on Si(001) single crystal substrates by RF sputtering. The deposited SrTiO3 films show a surface with roughness of 0.66nm. The orientation relationship was determined to be SrTiO3(001)[110]∥TiN(001)[110]∥Si(001)[110]. The microstructure and interface of the multilayer was studied using high resolution transmission electron microscopy (TEM). The electron diffraction pattern confirmed the epitaxial relationship between each layer.

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