Combined Ligand Exchange and Substitution Reactions in Atomic Layer Deposition of Conformal Ge2Sb2Te5 Film for Phase Change Memory Application

2015 ◽  
Vol 27 (10) ◽  
pp. 3707-3713 ◽  
Author(s):  
Taeyong Eom ◽  
Taehong Gwon ◽  
Sijung Yoo ◽  
Byung Joon Choi ◽  
Moo-Sung Kim ◽  
...  
RSC Advances ◽  
2019 ◽  
Vol 9 (30) ◽  
pp. 17291-17298 ◽  
Author(s):  
Yewon Kim ◽  
Byeol Han ◽  
Yu-Jin Kim ◽  
Jeeyoon Shin ◽  
Seongyoon Kim ◽  
...  

We studied the atomic layer deposition (ALD) and the tellurization of Ge–Sb films to prepare conformal crystalline Ge–Sb–Te (GST) films and to achieve void-free gap filling for emerging phase-change memory applications.


2019 ◽  
Vol 31 (21) ◽  
pp. 8752-8763 ◽  
Author(s):  
Eui-Sang Park ◽  
Chanyoung Yoo ◽  
Woohyun Kim ◽  
Manick Ha ◽  
Jeong Woo Jeon ◽  
...  

2019 ◽  
Vol 31 (21) ◽  
pp. 8663-8672 ◽  
Author(s):  
Eui-Sang Park ◽  
Chanyoung Yoo ◽  
Woohyun Kim ◽  
Manick Ha ◽  
Jeong Woo Jeon ◽  
...  

Author(s):  
Yoon Kyeung Lee ◽  
Chanyoung Yoo ◽  
Woohyun Kim ◽  
Jeongwoo Jeon ◽  
Cheol Seong Hwang

Atomic layer deposition (ALD) is a thin film growth technique that uses self-limiting, sequential reactions localized at the growing film surface. It guarantees exceptional conformality on high-aspect-ratio structures and controllability...


2020 ◽  
Vol 206 ◽  
pp. 110322 ◽  
Author(s):  
Nuria Navarrete ◽  
Damiano La Zara ◽  
Aristeidis Goulas ◽  
David Valdesueiro ◽  
Leonor Hernández ◽  
...  

2019 ◽  
Vol 31 (8) ◽  
pp. 5833-5837
Author(s):  
Hao Wang ◽  
Sannian Song ◽  
Zhitang Song ◽  
Zhiguo Zhou ◽  
Dongning Yao ◽  
...  

2016 ◽  
Author(s):  
Sannian Song ◽  
Lanlan Shen ◽  
Zhitang Song ◽  
Dongning Yao ◽  
Tianqi Guo ◽  
...  

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