Atomic Layer Deposition of Ternary Compounds on Cu(In,Ga)Se2: An In Situ Quartz Crystal Microbalance Study

ACS Applied Energy Materials ◽

10.1021/acsaem.0c01284 ◽

2020 ◽

Vol 3 (7) ◽

pp. 7208-7215

Author(s):

Fredrik Larsson ◽

Lars Stolt ◽

Adam Hultqvist ◽

Marika Edoff ◽

Jan Keller ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Quartz Crystal Microbalance ◽

Quartz Crystal ◽

Atomic Layer ◽

Ternary Compounds ◽

Layer Deposition

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Study of Atomic Layer Deposition of ZnO on a Polar Oxide Substrate by In Situ Quartz Crystal Microbalance

ECS Transactions ◽

10.1149/1.3633674 ◽

2019 ◽

Vol 41 (2) ◽

pp. 247-253 ◽

Author(s):

Kallol Pradhan ◽

Paul F. Lyman

Keyword(s):

Atomic Layer Deposition ◽

Quartz Crystal Microbalance ◽

Quartz Crystal ◽

Atomic Layer ◽

Layer Deposition ◽

Oxide Substrate ◽

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Dynamic parameter estimation of atomic layer deposition kinetics applied to in situ quartz crystal microbalance diagnostics

Chemical Engineering Science ◽

10.1016/j.ces.2014.02.005 ◽

2014 ◽

Vol 111 ◽

pp. 15-33 ◽

Author(s):

A. Holmqvist ◽

T. Törndahl ◽

F. Magnusson ◽

U. Zimmermann ◽

S. Stenström

Keyword(s):

Parameter Estimation ◽

Atomic Layer Deposition ◽

Quartz Crystal Microbalance ◽

Quartz Crystal ◽

Atomic Layer ◽

Dynamic Parameter ◽

Deposition Kinetics ◽

Layer Deposition ◽

Dynamic Parameter Estimation

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In situ examination of tin oxide atomic layer deposition using quartz crystal microbalance and Fourier transform infrared techniques

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1914810 ◽

2005 ◽

Vol 23 (4) ◽

pp. 581-588 ◽

Author(s):

X. Du ◽

Y. Du ◽

S. M. George

Keyword(s):

Fourier Transform ◽

Atomic Layer Deposition ◽

Quartz Crystal Microbalance ◽

Tin Oxide ◽

Quartz Crystal ◽

Atomic Layer ◽

Layer Deposition ◽

Infrared Techniques ◽

In Situ Examination

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Study of Atomic Layer Deposition of ZnO on Polar Oxide Substrate by In Situ Quartz Crystal Microbalance

ECS Meeting Abstracts ◽

10.1149/ma2011-02/26/1870 ◽

2011 ◽

Keyword(s):

Atomic Layer Deposition ◽

Quartz Crystal Microbalance ◽

Quartz Crystal ◽

Atomic Layer ◽

Layer Deposition ◽

Oxide Substrate ◽

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In Situ Quartz Crystal Microbalance and Quadrupole Mass Spectrometry Studies of Atomic Layer Deposition of Aluminum Oxide from Trimethylaluminum and Water

Langmuir ◽

10.1021/la010103a ◽

2001 ◽

Vol 17 (21) ◽

pp. 6506-6509 ◽

Author(s):

Antti Rahtu ◽

Teemu Alaranta ◽

Mikko Ritala

Keyword(s):

Mass Spectrometry ◽

Atomic Layer Deposition ◽

Aluminum Oxide ◽

Quartz Crystal Microbalance ◽

Quartz Crystal ◽

Atomic Layer ◽

Quadrupole Mass ◽

Quadrupole Mass Spectrometry ◽

Layer Deposition

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In Situ Quadrupole Mass Spectrometry and Quartz Crystal Microbalance Studies on the Atomic Layer Deposition of Titanium Dioxide from Titanium Tetrachloride and Water

Chemistry of Materials ◽

10.1021/cm011046+ ◽

2001 ◽

Vol 13 (12) ◽

pp. 4506-4511 ◽

Author(s):

Raija Matero ◽

Antti Rahtu ◽

Mikko Ritala

Keyword(s):

Mass Spectrometry ◽

Titanium Dioxide ◽

Atomic Layer Deposition ◽

Quartz Crystal Microbalance ◽

Quartz Crystal ◽

Titanium Tetrachloride ◽

Atomic Layer ◽

Quadrupole Mass ◽

Layer Deposition

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Comparison of precursor infiltration into polymer thin films via atomic layer deposition and sequential vapor infiltration using in-situ quartz crystal microgravimetry

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4882654 ◽

2014 ◽

Vol 32 (4) ◽

pp. 041602 ◽

Author(s):

Richard P. Padbury ◽

Jesse S. Jur

Keyword(s):

Atomic Layer Deposition ◽

Quartz Crystal ◽

Polymer Thin Films ◽

Atomic Layer ◽

Layer Deposition ◽

Quartz Crystal Microgravimetry ◽

Vapor Infiltration

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Quartz crystal microbalance study of tungsten atomic layer deposition using WF6 and Si2H6

Thin Solid Films ◽

10.1016/j.tsf.2005.04.114 ◽

2005 ◽

Vol 488 (1-2) ◽

pp. 103-110 ◽

Author(s):

F.H. Fabreguette ◽

Z.A. Sechrist ◽

J.W. Elam ◽

S.M. George

Keyword(s):

Atomic Layer Deposition ◽

Quartz Crystal Microbalance ◽

Quartz Crystal ◽

Atomic Layer ◽

Layer Deposition

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Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition

Review of Scientific Instruments ◽

10.1063/1.1490410 ◽

2002 ◽

Vol 73 (8) ◽

pp. 2981-2987 ◽

Author(s):

J. W. Elam ◽

M. D. Groner ◽

S. M. George

Keyword(s):

Thin Film ◽

Atomic Layer Deposition ◽

Viscous Flow ◽

Quartz Crystal Microbalance ◽

Quartz Crystal ◽

Film Growth ◽

Flow Reactor ◽

Atomic Layer ◽

Thin Film Growth ◽

Layer Deposition

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Temperature-Induced Apparent Mass Changes Observed during Quartz Crystal Microbalance Measurements of Atomic Layer Deposition

Analytical Chemistry ◽

10.1021/ac030141u ◽

2003 ◽

Vol 75 (19) ◽

pp. 4975-4982 ◽

Author(s):

M. N. Rocklein ◽

S. M. George

Keyword(s):

Atomic Layer Deposition ◽

Quartz Crystal Microbalance ◽

Quartz Crystal ◽

Atomic Layer ◽

Apparent Mass ◽

Layer Deposition

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