In situ examination of tin oxide atomic layer deposition using quartz crystal microbalance and Fourier transform infrared techniques

2005 ◽  
Vol 23 (4) ◽  
pp. 581-588 ◽  
Author(s):  
X. Du ◽  
Y. Du ◽  
S. M. George
Keyword(s):  
Fourier Transform ◽  
Atomic Layer Deposition ◽  
Quartz Crystal Microbalance ◽  
Tin Oxide ◽  
Quartz Crystal ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Infrared Techniques ◽  
In Situ Examination

scholarly journals Atomic Layer Deposition of Ternary Compounds on Cu(In,Ga)Se2: An In Situ Quartz Crystal Microbalance Study

2020 ◽  
Vol 3 (7) ◽  
pp. 7208-7215
Author(s):  
Fredrik Larsson ◽  
Lars Stolt ◽  
Adam Hultqvist ◽  
Marika Edoff ◽  
Jan Keller ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Quartz Crystal Microbalance ◽  
Quartz Crystal ◽  
Atomic Layer ◽  
Ternary Compounds ◽  
Layer Deposition

Quartz crystal microbalance study of tungsten atomic layer deposition using WF6 and Si2H6

2005 ◽  
Vol 488 (1-2) ◽  
pp. 103-110 ◽  
Author(s):  
F.H. Fabreguette ◽  
Z.A. Sechrist ◽  
J.W. Elam ◽  
S.M. George
Keyword(s):  
Atomic Layer Deposition ◽  
Quartz Crystal Microbalance ◽  
Quartz Crystal ◽  
Atomic Layer ◽  
Layer Deposition

Surface species during ALD of platinum observed with in situ reflection IR spectroscopy

2018 ◽  
Vol 20 (39) ◽  
pp. 25343-25356 ◽  
Author(s):  
Michiel Van Daele ◽  
Christophe Detavernier ◽  
Jolien Dendooven
Keyword(s):  
Fourier Transform ◽  
Infrared Spectroscopy ◽  
Ir Spectroscopy ◽  
Atomic Layer Deposition ◽  
Fourier Transform Infrared Spectroscopy ◽  
Atomic Layer ◽  
Surface Species ◽  
Layer Deposition ◽  
Substrate Temperatures

Thermal atomic layer deposition (ALD) and plasma-enhanced ALD (PE-ALD) of Pt, using MeCpPtMe3 as the precursor and O2 gas or O2 plasma as the reactant, are studied with in situ reflection Fourier transform infrared spectroscopy (FTIR) at different substrate temperatures.

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