scholarly journals Interplay of Anionic Quasi-Atoms and Interstitial Point Defects in Electrides: Abnormal Interstice Occupation and Colossal Charge State of Point Defects in Dense fcc-Lithium

2021 ◽  
Vol 13 (5) ◽  
pp. 6130-6139
Author(s):  
Leilei Zhang ◽  
Qiang Wu ◽  
Shourui Li ◽  
Yi Sun ◽  
Xiaozhen Yan ◽  
...  
Keyword(s):  

Crystals ◽  
2019 ◽  
Vol 9 (1) ◽  
pp. 48 ◽  
Author(s):  
Qing Peng ◽  
Nanjun Chen ◽  
Danhong Huang ◽  
Eric Heller ◽  
David Cardimona ◽  
...  

Point defects are inevitable, at least due to thermodynamics, and essential for engineering semiconductors. Herein, we investigate the formation and electronic structures of fifteen different kinds of intrinsic point defects of zinc blende indium arsenide (zb-InAs ) using first-principles calculations. For As-rich environment, substitutional point defects are the primary intrinsic point defects in zb-InAs until the n-type doping region with Fermi level above 0.32 eV is reached, where the dominant intrinsic point defects are changed to In vacancies. For In-rich environment, In tetrahedral interstitial has the lowest formation energy till n-type doped region with Fermi level 0.24 eV where substitutional point defects In A s take over. The dumbbell interstitials prefer < 110 > configurations. For tetrahedral interstitials, In atoms prefer 4-As tetrahedral site for both As-rich and In-rich environments until the Fermi level goes above 0.26 eV in n-type doped region, where In atoms acquire the same formation energy at both tetrahedral sites and the same charge state. This implies a fast diffusion along the t − T − t path among the tetrahedral sites for In atoms. The In vacancies V I n decrease quickly and monotonically with increasing Fermi level and has a q = − 3 e charge state at the same time. The most popular vacancy-type defect is V I n in an As-rich environment, but switches to V A s in an In-rich environment at light p-doped region when Fermi level below 0.2 eV. This study sheds light on the relative stabilities of these intrinsic point defects, their concentrations and possible diffusions, which is expected useful in defect-engineering zb-InAs based semiconductors, as well as the material design for radiation-tolerant electronics.



2016 ◽  
Vol 18 (9) ◽  
pp. 6734-6741 ◽  
Author(s):  
Xin Xiang ◽  
Guikai Zhang ◽  
Feilong Yang ◽  
Xuexing Peng ◽  
Tao Tang ◽  
...  

Cr has significant influence on the formation, charge state, relative stability and equilibrium configuration of isolated intrinsic point defects in α-Al2O3, resulting in the variation of defect process in α-Al2O3.



1998 ◽  
Vol 510 ◽  
Author(s):  
A. Mesli ◽  
A. Nylandsted Larsen

AbstractThe use of compositionally graded buffer layers in the growth of fully relaxed epitaxial Si1−xGex alloy layers has led to a major improvement in crystalline quality. A considerable reduction in the density of the threading dislocations has become possible, facilitating point defect studies in these materials. The issues addressed in this review are inherent to the coupling between band gap engineering and defect-related levels. Among them, the pinning behaviour, charge state effects and their consequence upon the thermal stability of point defects are discussed together with the impact of the fluctuation in Ge distribution



2004 ◽  
Vol 40 (10) ◽  
pp. 1026-1031 ◽  
Author(s):  
D. M. Freik ◽  
V. M. Boichuk ◽  
L. I. Mezhilovskaya


2009 ◽  
Vol 131 (48) ◽  
pp. 17544-17545 ◽  
Author(s):  
T. König ◽  
G. H. Simon ◽  
H.-P. Rust ◽  
G. Pacchioni ◽  
M. Heyde ◽  
...  
Keyword(s):  


2008 ◽  
Vol 1070 ◽  
Author(s):  
Naveen Gupta ◽  
Wolfgang Windl

ABSTRACTTwo recent papers by Pei et al. and Steen et al. have shown that the observed pile-up of arsenic at Si/SiO2 interfaces surprisingly does not seem to involve point defects as a major factor, causes local distortions that strain the Si in the pile-up region locally, and that the segregated arsenic atoms are deep donors. In this paper, we use ab-initio modeling to study possible configurations for high As concentrations that may fulfill these criteria. We find for a simple model structure that As nearest neighbors become stable in Si in the vicinity of the interface. We also have stud-ied dopant deactivation using bulk-Si models. Even without invoking point defects explicitly and starting from a purely substitutional arrangement, we find that the energetically most favorable configurations are most stable in the neutral charge state, indicating that high enough concentra-tions of arsenic atoms make them electrically inactive and hence result in dopant dose loss.



2019 ◽  
Vol 20 (2) ◽  
pp. 190-195
Author(s):  
L.V. Turovska

In the framework of crystalloquasichemical formalism, the mechanism of formation of Pb1–xAgxTe solid solutions has been considered. The dependences of Hall concentration and the concentration of point defects on composition of solid solution and the value of disproportionation of the charge state of impurity defects have been calculated.



1975 ◽  
Vol 16 (1) ◽  
pp. 171-174 ◽  
Author(s):  
L.C. Kimerling ◽  
H.M. DeAngelis ◽  
J.W. Diebold


1992 ◽  
Vol 83-87 ◽  
pp. 1153-1158 ◽  
Author(s):  
W.R. Buchwald ◽  
Hermann G. Grimmeiss ◽  
F. Christopher Rong ◽  
N.M. Johnson ◽  
E.H. Poindexter ◽  
...  


Author(s):  
W. T. Donlon ◽  
S. Shinozaki ◽  
E. M. Logothetis ◽  
W. Kaizer

Since point defects have a limited solubility in the rutile (TiO2) lattice, small deviations from stoichiometry are known to produce crystallographic shear (CS) planes which accomodate local variations in composition. The material used in this study was porous polycrystalline TiO2 (60% dense), in the form of 3mm. diameter disks, 1mm thick. Samples were mechanically polished, ion-milled by conventional techniques, and initially examined with the use of a Siemens EM102. The electron transparent thin foils were then heat-treated under controlled atmospheres of CO/CO2 and H2 and reexamined in the same manner.The “as-received” material contained mostly TiO2 grains (∼5μm diameter) which had no extended defects. Several grains however, aid exhibit a structure similar to micro-twinned grains observed in reduced rutile. Lattice fringe images (Fig. 1) of these grains reveal that the adjoining layers are not simply twin related variants of a single TinO2n-1 compound. Rather these layers (100 - 250 Å wide) are alternately comprised of stoichiometric TiO2 (rutile) and reduced TiO2 in the form of Ti8O15, with the Ti8O15 layers on either side of the TiO2 being twin related.



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