Substrate Bias Voltage Tailoring the Interfacial Chemistry of a-SiCx:H: A Surprising Improvement in Adhesion of a-C:H Thin Films Deposited on Ferrous Alloys Controlled by Oxygen
2019 ◽
Vol 11
(19)
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pp. 18024-18033
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2006 ◽
Vol 36
(3b)
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pp. 994-996
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2009 ◽
Vol 22
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pp. 373-376
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2011 ◽
Vol 258
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pp. 1789-1796
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2015 ◽
Vol 53
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pp. 549-554
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2008 ◽
Vol 17
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pp. 696-699
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