Effect of the substrate bias voltage on the mechanical properties of nanocomposite CrZrSiN thin films

2015 ◽  
Vol 53 (8) ◽  
pp. 549-554 ◽  
Author(s):  
Sang-Yul Lee ◽  
Kyu-Sung Kim ◽  
Hoe-Kun Kim ◽  
Joung-Hyun La ◽  
Kwang-Bae Kim
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Bias Voltage ◽  
Substrate Bias ◽  
Substrate Bias Voltage

Influence of substrate bias voltage on the properties of sputtered nickel oxide thin films

2012 ◽  
Author(s):  
A. Mallikarjuna Reddy ◽  
Ch. Seshendra Reddy ◽  
Y. Ashok Kumar Reddy ◽  
R. Lydia ◽  
P. Sreedhara Reddy ◽  
...  
Keyword(s):  
Thin Films ◽  
Nickel Oxide ◽  
Bias Voltage ◽  
Substrate Bias ◽  
Oxide Thin Films ◽  
Substrate Bias Voltage ◽  
Influence Of Substrate ◽  
Nickel Oxide Thin Films

Effect of substrate bias voltage on the composition, microstructure and mechanical properties of W-B-C coatings

2020 ◽  
Vol 528 ◽  
pp. 146966
Author(s):  
S. Mirzaei ◽  
M. Alishahi ◽  
P. Souček ◽  
V. Buršíková ◽  
L. Zábranský ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Bias Voltage ◽  
Substrate Bias ◽  
Substrate Bias Voltage ◽  
Microstructure And Mechanical Properties

Influence of substrate bias voltage on properties of Pt thin films deposited by non-mass separated ion beam deposition method

2009 ◽  
Vol 63 (26) ◽  
pp. 2181-2184 ◽  
Author(s):  
Joon Woo Bae ◽  
Jae-Won Lim ◽  
Kouji Mimura ◽  
Masahito Uchikoshi ◽  
Mitsuhiro Wada ◽  
...  
Keyword(s):  
Thin Films ◽  
Bias Voltage ◽  
Ion Beam ◽  
Substrate Bias ◽  
Deposition Method ◽  
Substrate Bias Voltage ◽  
Ion Beam Deposition ◽  
Influence Of Substrate ◽  
Beam Deposition

scholarly journals A study of properties of ZrO2 thin films deposited by magnetron sputtering under different plasma parameters: Biomedical application

2019 ◽  
Vol 70 (7) ◽  
pp. 117-121 ◽  
Author(s):  
Hind Zegtouf ◽  
Nadia Saoula ◽  
Mourad Azibi ◽  
Larbi Bait ◽  
Noureddine Madaoui ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Biomedical Application ◽  
Steel Substrate ◽  
Substrate Bias ◽  
X Rays ◽  
Plasma Parameters ◽  
Substrate Bias Voltage ◽  
Deposited Films

Abstract ZrO2 thin films were deposited on 316L stainless steel substrate by a radio-frequency magnetron sputtering system. The substrate bias voltage, the working gas rate and the reactive gas fraction in the gas mixture were varied. These variations produce a variation in the deferent properties of the obtained films. The deposited films were characterized by X-Rays Diffraction, Atomic Force Microscopy, nano-indentation and potentiodynamic polarization. The experimental results show that the film thickness and the roughness of the films are highly influenced by the plasma parameters. XRD results show that the monoclinic phase is predominant in unbiased deposited films. The best anti-corrosion performance and hardness were obtained for ZrO2 deposited with a substrate bias voltage of −75 V, Ar rate of 6 sccm and oxygen fraction of 25%.

Substrate Bias Voltage Tailoring the Interfacial Chemistry of a-SiCx:H: A Surprising Improvement in Adhesion of a-C:H Thin Films Deposited on Ferrous Alloys Controlled by Oxygen

2019 ◽  
Vol 11 (19) ◽  
pp. 18024-18033 ◽  
Author(s):  
Ângela E. Crespi ◽  
Leonardo M. Leidens ◽  
Vinicius Antunes ◽  
Bruna L. Perotti ◽  
Alexandre F. Michels ◽  
...  
Keyword(s):  
Thin Films ◽  
Bias Voltage ◽  
Substrate Bias ◽  
Interfacial Chemistry ◽  
Ferrous Alloys ◽  
Substrate Bias Voltage
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