Scattering of High-Incident-Energy Kr and Xe from Ice: Evidence that a Major Channel Involves Penetration into the Bulk

2012 ◽  
Vol 116 (27) ◽  
pp. 14264-14273 ◽  
Author(s):  
K. D. Gibson ◽  
Daniel R. Killelea ◽  
Hanqiu Yuan ◽  
James S. Becker ◽  
Subha Pratihar ◽  
...  
Keyword(s):  
Incident Energy ◽  
High Incident Energy

scholarly journals THE SUCCESS OF THE DISTORTED WAVE METHOD AT VERY HIGH INCIDENT ENERGY

1986 ◽  
Vol 47 (C4) ◽  
pp. C4-179-C4-182
Author(s):  
J. BARRETTE ◽  
B. BERTHIER ◽  
J. GASTEBOIS ◽  
A. GILLIBERT ◽  
R. LUCAS ◽  
...  
Keyword(s):  
Incident Energy ◽  
Wave Method ◽  
Distorted Wave ◽  
High Incident Energy ◽  
Distorted Wave Method ◽  
Very High

Atomistic Mechanism of Ion Beam Deposition Induced Curvature Formation in Thin-Films

2007 ◽  
Author(s):  
Sachin S. Terdalkar ◽  
Sulin Zhang ◽  
Joseph J. Rencis
Keyword(s):  
Kinetic Energy ◽  
Incident Energy ◽  
Ion Beam ◽  
Md Simulations ◽  
Stress Generation ◽  
Intrinsic Stress ◽  
Graphene Sheets ◽  
High Incident Energy ◽  
Upward Deflection ◽  
Generation Mechanisms

Molecular dynamics (MD) simulations are performed to study the stress generation mechanisms in cantilever graphene sheets impacted by energetic carbon neutrals. The carbon-carbon interactions are described by the Tersoff-Brenner potential [1]. The MD simulations show that the free-end deflection of the graphene sheets is strongly dependent on the kinetic energy of the incident ions. At low incident energy (<<10eV), the free end bends towards to the side on which ions are deposited (upward deflection); at high incident energy, the free end bends away from the side on which the ions are deposited (downward deflection). The downward deflection reaches its maximum at around 50 eV, beyond which the downward deflection decreases with increasing incident energies. In addition, the evolution of the free-end deflection in terms of the number of deposited atoms is also dependent on the kinetic energy of the incident ions. These numerical observations suggest that intrinsic stress of different levels in the graphene sheets is generated. A close examination of the microstructures of the grown films indicates that the generated stress can be attributed to a competing mechanism of the production and annihilation of vacancy-like and interstitial-like defects in the films.

Backscattered Electron Imaging in the Scanning Electron Microscope: the Use of Either: (a) High Incident Energy or (b) an Array Detector

2008 ◽  
Vol 14 (S2) ◽  
pp. 120-121
Author(s):  
LM Gignac ◽  
OC Wells ◽  
C-K Hu ◽  
J Bruley ◽  
CE Murray ◽  
...  
Keyword(s):  
Electron Microscope ◽  
New Mexico ◽  
Scanning Electron Microscope ◽  
Incident Energy ◽  
Array Detector ◽  
Backscattered Electron Imaging ◽  
High Incident Energy ◽  
Backscattered Electron ◽  
Electron Imaging ◽  
Scanning Electron

Extended abstract of a paper presented at Microscopy and Microanalysis 2008 in Albuquerque, New Mexico, USA, August 3 – August 7, 2008

Cross-section fluctuations in theMg24,C12scatterings at high incident energy

1982 ◽  
Vol 25 (5) ◽  
pp. 2815-2818 ◽  
Author(s):  
M. C. Mermaz ◽  
A. Greiner ◽  
M. LeVine ◽  
F. Jundt ◽  
J. -P. Coffin ◽  
...  
Keyword(s):  
Cross Section ◽  
Incident Energy ◽  
High Incident Energy

scholarly journals Effect of Sputter Deposition on the Adhesion and Failure Behavior between Cu Film and Glassy Calcium Aluminosilicate: A Molecular Dynamics Study

Metals ◽  
2021 ◽  
Vol 11 (9) ◽  
pp. 1365
Author(s):  
Hyunhang Park ◽  
Sunghoon Lee
Keyword(s):  
Molecular Dynamics ◽  
Incident Energy ◽  
Adhesion Force ◽  
Film Deposition ◽  
Dynamics Simulation ◽  
Failure Behavior ◽  
Face Centered Cubic ◽  
High Incident Energy ◽  
Cu Film ◽  
Calcium Aluminosilicate

Understanding the physical vapor deposition (PVD) process of metallic coatings on an inorganic substrate is essential for the packaging and semiconductor industry. In this work, we investigate a Copper (Cu) film deposition on a glassy Calcium Aluminosilicate (CAS) by PVD and its dependence on the incident energy. Molecular dynamics simulation is adopted to mimic the deposition process, and pure Cu film is grown on top of CAS surface forming intermixing region (IR) of Cu oxide. In the initial stage of deposition, incident Cu atoms are diffused into CAS bulk and aggregated at the surface which leads to the formation of IR. When the high incident energy, 2 eV, is applied, 20% more Cu atoms are observed at the interface compared to the low incident energy, 0.2 eV, due to enhanced lateral diffusion. As the Cu film grows, the amorphous thin Cu layer of 1 nm is temporarily formed on top of CAS, and crystallization with face-centered cubic from amorphous structure follows regardless of incident energy, and surface roughness is observed to be low for high incident energy cases. Deformation and failure behavior of Cu-CAS bilayer by pulling is investigated by steered molecular dynamics technique. The adhesive failure mode is observed, which implies the bilayer experiences a failure at the interface, and a 7% higher adhesion force is predicted for the high incident energy case. To find an origin of adhesion enhancement, the distribution of Cu atoms on the fractured CAS surface is analyzed, and it turns out that 6.3% more Cu atoms remain on the surface, which can be regarded as a source for the high adhesion force. Our findings hopefully give the insight to understand deposition and failure mechanisms between heterogeneous materials and are also helping to further improve Cu adhesion in sputter experiments.

Time-Current-Voltage Overcurrent Scheme for Reliable Microgrids Protection Considering Arc Flash Incident Energy

2020 ◽  
Author(s):  
Saad. M. Saad ◽  
Naser El Naily ◽  
Abdelsalam Elhaffar ◽  
T. Hussein ◽  
Faisal A. Mohamed
Keyword(s):  
Incident Energy ◽  
Current Voltage ◽  
Arc Flash

MICROSCOPIC APPROACH TO SCATTERING OF UNSTABLE NUCLEI

2010 ◽  
Vol 25 (21n23) ◽  
pp. 1754-1758
Author(s):  
MASANOBU YAHIRO ◽  
KOSHO MINOMO ◽  
KAZUYUKI OGATA ◽  
YOSHIFUMI R. SHIMIZU ◽  
TAKUMA MATSUMOTO ◽  
...  
Keyword(s):  
Energy Range ◽  
Incident Energy ◽  
Optical Potential ◽  
Recent Progress ◽  
Proton Scattering ◽  
Microscopic Approach ◽  
Unstable Nuclei ◽  
Coupled Channels ◽  
Localized Form

This article is composed of three subjects. First, the relation between the method of continuum-discretized coupled channels (CDCC) and the Faddeev theory is clarified to show the validity of CDCC. Second, CDCC is applied to four-body reactions such as (6 He , nn 4 He ) as an example of recent progress in CDCC. Third, we propose a microscopic version of CDCC in which a localized form of the microscopic nucleon-nucleus optical potential is used as an input of CDCC calculation instead of the phenomenological optical potential commonly used. The validity of the Brieva-Rook localization is shown for the proton scattering in a wide incident-energy range.

scholarly journals Formation of HCN+ in collisions of N+ and N2+ with a self-assembled propanethiol surface on gold

2021 ◽  
Author(s):  
Faro Hechenberger ◽  
Siegfried Kollotzek ◽  
Lorenz Ballauf ◽  
Felix Duensing ◽  
Milan Ončák ◽  
...  
Keyword(s):  
Energy Range ◽  
Incident Energy ◽  
Gold Surface ◽  
Self Assembled Monolayer ◽  
Polycrystalline Gold ◽  
Self Assembled

Collisions of N+ and N2+ with C3 hydrocarbons, represented by a self assembled monolayer of propanethiol on a polycrystalline gold surface, were investigated by experiments over the incident energy range between 5 eV and 100 eV.

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