Electrochemical Delamination of CVD-Grown Graphene Film: Toward the Recyclable Use of Copper Catalyst

ACS Nano ◽  
2011 ◽  
Vol 5 (12) ◽  
pp. 9927-9933 ◽  
Author(s):  
Yu Wang ◽  
Yi Zheng ◽  
Xiangfan Xu ◽  
Emilie Dubuisson ◽  
Qiaoliang Bao ◽  
...  
Author(s):  
Joon Hyong Cho ◽  
Guoao Sun ◽  
Michael Cullinan

One of the major challenges in producing highly accurate graphene-based nanoelectromechanical (NEMS) resonators is the poor fabrication repeatability of graphene-based NEMS devices due to small variations in the residual stress and initial tension of the graphene film. This has meant that graphene-based nanoelectromechanical resonators tend to have large variations in natural frequency and quality factor from device to device. This poor repeatability makes it impossible to use these resonators to make accurate, high-precision force and displacement sensors or electromechanical filters. However, by actively controlling the tension on the graphene resonator it is possible both to increase repeatability between devices and to increase the force/mass sensitivity of the nanoelectromechanical resonators produced. Such tension control makes it possible to produce electrometrical filters that can be precisely tuned over a frequency range of up to several orders-of-magnitude. In order to controllably strain the graphene resonator, a microelectromechanical system (MEMS) is be used to apply tension to the graphene. The MEMS device consists of a graphene resonator connected between a set of gold electrodes. Each gold electrode is located on a different MEMS stage. Each stage is connected to a set of flexural bearings which are used to guide the motion of the stage. The displacement stage is actuated using a thermal actuator that allows a uniform and constant tension to be applied to the graphene resonator. The displacement of the actuator and the tension applied to the graphene are measured using a pair of differential capacitive actuators. The resonator is actuated electrostatically using the electrical back gate, and the resonant frequency is measured from the change in conductance of the graphene as it approaches resonance. Using this setup, it is possible to tune the natural frequency of the graphene resonator with high precision and accuracy. In addition to designing devices that can compensate for manufacturing errors in nanomanufactured devices, this paper will present several methods that can greatly expand the scope and rate at which nanomaterials-based devices can be fabricated. For example, this paper will present a transfer-free, wafer-scale manufacturing process that can be used to produce suspended graphene-based devices such as the graphene-based NEMS resonators. This new method involves the growth of graphene directly on the device wafer and release of the graphene-based device through etching of the copper catalyst layer. This method replaces traditional graphene fabrication methods, such as mechanical exfoliation, electron beam lithography, or transfer from copper foils, which are slow and require a transfer step that is the source of much of inconsistency in suspended graphene-based devices. Therefore, these new transfer-free, wafer-scale fabrication methods offer the potential to increase the throughput, yield, and repeatability of manufacturing processes for graphene resonators while reducing manufacturing costs and complexity.


Coatings ◽  
2021 ◽  
Vol 11 (5) ◽  
pp. 523
Author(s):  
Cong Wang ◽  
Chengchen Xu

Chemical doping of boron atoms is essential to modify the electrical properties of graphene films. The synthesis of large-scale boron-doped graphene with high uniformity and good electrical properties is still a great challenge. To improve the quality and uniformity of boron-doped graphene, we introduced several methods to engineer the surface of the copper catalyst for chemical vapor deposition. The ethylic acid treatment proved to be more effective to remove surface impurities than the hydrochloric acid treatment. Moreover, electrochemical polishing showed the best performance in reducing the impurities and surface roughness in all the methods. The sheet resistance and carrier mobility of the boron-doped graphene film grown on the electropolished copper foil were 2.35 kΩ/□ and 1.15 × 103 cm2·V−1·s−1 at room temperature, respectively. Our results suggest that the boron-doped graphene grown on the electropolished copper catalyst possesses a high carrier mobility and less structural defects, which makes it suitable for application in optoelectronics.


2013 ◽  
Vol 774-776 ◽  
pp. 634-639
Author(s):  
Peng Fei Zhao ◽  
Da Wei He ◽  
Yong Sheng Wang ◽  
Ming Fu ◽  
Hong Peng Wu ◽  
...  

We optimized the CH4 and H2 gas flow rate of chemical vapor deposition (CVD) graphene growth and obtained larger area, fewer-layered graphene grown on Cu foils. After transfering to SiO2 substrate by PMMA more than 3 times to repair the defect of monolayer graphene film, we synthesized large area, transparent and continuous graphene film. The morphology and structure were characterized by SEM and Raman spectroscopy. Analysis of electrical properties and optical properties show that we obtained low resistance and high transparency of ~90%, which could be used on photoelectric device as solar cell and acceptable for replacing commercial ITO electrodes.


2017 ◽  
Vol 9 (50) ◽  
pp. 43696-43703 ◽  
Author(s):  
Zhenzhen Du ◽  
Chengkun Guo ◽  
Linjun Wang ◽  
Ajuan Hu ◽  
Song Jin ◽  
...  

2015 ◽  
Vol 815 ◽  
pp. 18-21
Author(s):  
Tao Huang ◽  
Lin Chen ◽  
Qing Qing Sun ◽  
Peng Zhou ◽  
David Wei Zhang

Graphene is a novel two dimensional material with exceptional properties. Chemical vapor deposition of graphene on metal substrates is widely used to prepare high quality graphene film. However, the graphene films need to be transferred to oxide substrates for device applications. A chemical vapor deposition approach for direct growth of graphene films on zinc oxide was demonstrated in the present investigation. Raman spectra were used to characterize the grown graphene films. The impact of the growth temperature, time and gas flow ratio on the layer number and crystallite size of graphene was investigated.


2021 ◽  
Author(s):  
Junzhu Li ◽  
Mingguang Chen ◽  
Abdus Samad ◽  
Haocong Dong ◽  
Avijeet Ray ◽  
...  

Abstract Currently, the direct synthesis of inch-scale single-crystal graphene on insulating substrates is limited by the lack of metal catalysis, suitable crystallization conditions, and self-limiting growth mechanisms. In this study, we investigated a direct growth of adlayer-free ultra-flat wafer-scale single-crystal monolayer graphene on insulating substrates by the multi-loop plasma-etching-assisted chemical vapor deposition (MPE-CVD) method. Firstly, an atomic-thick growth nanochamber was created by fabricating single-crystal Cu(111) foils on Al2O3(0001) substrates, in which graphene was directly synthesized by MPE-CVD. After growth, the Cu(111) foil was detached using a liquid-nitrogen-assisted separation method, and the ultra-high-quality single-crystal graphene film was experimentally achieved on Al2O3(0001). The field-effect transistors fabricated on the directly grown graphene exhibited excellent electronic transport properties with high carrier mobilities. This work breaks the bottleneck in the direct synthesis of single-crystal graphene on insulating substrates and paves the way for next-generation carbon-based atomic electronics and semiconductor nanodevices.


Molecules ◽  
2020 ◽  
Vol 25 (17) ◽  
pp. 3856 ◽  
Author(s):  
Maryam Saeed ◽  
Yousef Alshammari ◽  
Shereen A. Majeed ◽  
Eissa Al-Nasrallah

Graphene as the 2D material with extraordinary properties has attracted the interest of research communities to master the synthesis of this remarkable material at a large scale without sacrificing the quality. Although Top-Down and Bottom-Up approaches produce graphene of different quality, chemical vapour deposition (CVD) stands as the most promising technique. This review details the leading CVD methods for graphene growth, including hot-wall, cold-wall and plasma-enhanced CVD. The role of process conditions and growth substrates on the nucleation and growth of graphene film are thoroughly discussed. The essential characterisation techniques in the study of CVD-grown graphene are reported, highlighting the characteristics of a sample which can be extracted from those techniques. This review also offers a brief overview of the applications to which CVD-grown graphene is well-suited, drawing particular attention to its potential in the sectors of energy and electronic devices.


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