Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors

RSC Advances ◽  
2016 ◽  
Vol 6 (108) ◽  
pp. 106374-106379 ◽  
Author(s):  
Po-Tsun Liu ◽  
Chih-Hsiang Chang ◽  
Chur-Shyang Fuh

The influence of a backchannel passivation layer on the ambient stability of amorphous indium-zinc-tin-oxide thin-film transistors was studied. The ALD Al2O3 films and plasma-enhanced chemical vapor deposited SiO2 films were separately used as channel passivation layers.

2014 ◽  
Vol 44 (2) ◽  
pp. 651-657 ◽  
Author(s):  
Dong-Suk Han ◽  
Jae-Hyung Park ◽  
Min-Soo Kang ◽  
So-Ra Shin ◽  
Yeon-Jae Jung ◽  
...  

2018 ◽  
Vol 4 (7) ◽  
pp. 1800032 ◽  
Author(s):  
Cristina Fernandes ◽  
Ana Santa ◽  
Ângelo Santos ◽  
Pydi Bahubalindruni ◽  
Jonas Deuermeier ◽  
...  

2017 ◽  
Vol 13 (5) ◽  
pp. 406-411 ◽  
Author(s):  
Sang Tae Kim ◽  
Yeonwoo Shin ◽  
Pil Sang Yun ◽  
Jong Uk Bae ◽  
In Jae Chung ◽  
...  

2019 ◽  
Vol 33 (5) ◽  
pp. 295-299 ◽  
Author(s):  
Bong-Jin Kim ◽  
Hyung-Jun Kim ◽  
Sung Mok Jung ◽  
Tae-Sik Yoon ◽  
Yong-Sang Kim ◽  
...  

2013 ◽  
Vol 62 (8) ◽  
pp. 1176-1182 ◽  
Author(s):  
Jong Hoon Lee ◽  
Chang Hoi Kim ◽  
Hong Seung Kim ◽  
Jae Hoon Park ◽  
Jin Hwa Ryu ◽  
...  

2013 ◽  
Vol 42 (8) ◽  
pp. 2470-2477 ◽  
Author(s):  
Dong-Suk Han ◽  
Jae-Hyung Park ◽  
Yu-Jin Kang ◽  
Jong-Wan Park

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