Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
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The influence of a backchannel passivation layer on the ambient stability of amorphous indium-zinc-tin-oxide thin-film transistors was studied. The ALD Al2O3 films and plasma-enhanced chemical vapor deposited SiO2 films were separately used as channel passivation layers.
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2014 ◽
Vol 44
(2)
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pp. 651-657
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2018 ◽
Vol 4
(7)
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pp. 1800032
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2017 ◽
Vol 13
(5)
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pp. 406-411
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2014 ◽
Vol 292
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pp. 915-920
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2013 ◽
Vol 42
(8)
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pp. 2470-2477
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