Functionalizable and electrically conductive thin films formed by oxidative chemical vapor deposition (oCVD) from mixtures of 3-thiopheneethanol (3TE) and ethylene dioxythiophene (EDOT)

Tuning the optoelectronic properties and the density of hydroxyl pendant groups of 3-thiopheneethanol-co-ethylenedioxythiohene produced via an oxidative chemical vapor deposition technique.

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Fabrication of aluminum oxide thin films by a low‐pressure metalorganic chemical vapor deposition technique

Applied Physics Letters ◽

10.1063/1.108838 ◽

1993 ◽

Vol 62 (7) ◽

pp. 681-683 ◽

Cited By ~ 34

Author(s):

J. S. Kim ◽

H. A. Marzouk ◽

P. J. Reucroft ◽

J. D. Robertson ◽

C. E. Hamrin

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Metalorganic Chemical

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Synthesis and Electrical Properties of (Bi1/2Na1/2)TiO3(BNT) Ferroelectric Thin Films by Liquid Sprayed Mist Chemical Vapor Deposition Technique

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2006.038 ◽

2006 ◽

Vol 6 (11) ◽

pp. 3479-3482

Author(s):

Bok-Hee Kim ◽

Sang-Hee Kim ◽

Jong-Hwan Kim ◽

Kun-Jae Lee ◽

Yong-Ho Choa ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Electrical Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Ferroelectric Thin Films ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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A simple method to deposit palladium doped SnO2 thin films using plasma enhanced chemical vapor deposition technique

Review of Scientific Instruments ◽

10.1063/1.3498898 ◽

2010 ◽

Vol 81 (11) ◽

pp. 113903 ◽

Cited By ~ 6

Author(s):

Young Soon Kim ◽

S. G. Ansari ◽

Z. A. Ansari ◽

Rizwan Wahab ◽

Hyung-Shik Shin

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Simple Method ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Sno2 Thin Films

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Hydrogenated Carbon Nitride Thin Films Deposited by the Plasma Chemical Vapor Deposition Technique Using Trimethylamine and Ammonia

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.5187 ◽

1997 ◽

Vol 36 (Part 1, No. 8) ◽

pp. 5187-5191 ◽

Cited By ~ 11

Author(s):

Satoshi Kobayashi ◽

Shinji Nozaki ◽

Hiroshi Morisaki ◽

Susumu Masaki

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Carbon Nitride ◽

Chemical Vapor ◽

Deposition Technique ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Growth and characterization of ZnO and MgxZn1−xO thin films by aerosol assisted chemical vapor deposition technique

Thin Solid Films ◽

10.1016/j.tsf.2011.12.075 ◽

2012 ◽

Vol 520 (9) ◽

pp. 3505-3509 ◽

Cited By ~ 8

Author(s):

Vipin K. Kaushik ◽

Tapas Ganguli ◽

Ravi Kumar ◽

C. Mukherjee ◽

P.K. Sen

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Crystal Structure of Zirconium Oxide Deposited as Thin Films from Zr-acetylacetonate and Zr-ter-butoxide by Laser Chemical Vapor Deposition Technique

Japanese Journal of Applied Physics ◽

10.1143/jjap.40.4051 ◽

2001 ◽

Vol 40 (Part 1, No. 6A) ◽

pp. 4051-4055 ◽

Cited By ~ 8

Author(s):

Akio Watanabe ◽

Tetsuo Tsuchiya ◽

Yoji Imai

Keyword(s):

Crystal Structure ◽

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Zirconium Oxide ◽

Chemical Vapor ◽

Deposition Technique ◽

Laser Chemical Vapor Deposition ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Deposition of Zinc Sulfide Thin Films From Zinc(II) Thiosemicarbazones as Single Molecular Precursors Using Aerosol Assisted Chemical Vapor Deposition Technique

Frontiers in Materials ◽

10.3389/fmats.2019.00046 ◽

2019 ◽

Vol 6 ◽

Cited By ~ 9

Author(s):

Anil M. Palve

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Zinc Sulfide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Technique ◽

Molecular Precursors ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Deposition of copper-doped iron sulfide (CuxFe1−xS) thin films using aerosol-assisted chemical vapor deposition technique

Applied Organometallic Chemistry ◽

10.1002/aoc.1676 ◽

2010 ◽

Vol 24 (10) ◽

pp. 734-740 ◽

Cited By ~ 7

Author(s):

Sujit D. Disale ◽

Shivram S. Garje

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Iron Sulfide ◽

Chemical Vapor ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Characteristics of lithium phosphorous oxynitride thin films deposited by metal-organic chemical vapor deposition technique

Journal of Power Sources ◽

10.1016/j.jpowsour.2012.12.109 ◽

2013 ◽

Vol 244 ◽

pp. 641-645 ◽

Cited By ~ 28

Author(s):

Hong Tak Kim ◽

Taehong Mun ◽

Chinho Park ◽

Sang Wan Jin ◽

Ho Young Park

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Deposition Technique ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Correlation study of microstructure and photoluminescence properties of a-C:H thin films deposited by plasma-enhanced chemical vapor deposition technique

Diamond and Related Materials ◽

10.1016/j.diamond.2017.10.006 ◽

2017 ◽

Vol 80 ◽

pp. 76-83 ◽

Cited By ~ 7

Author(s):

Mingming Li ◽

Lihua Jiang ◽

Yihua Sun ◽

Ting Xiao ◽

Peng Xiang ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Correlation Study ◽

Deposition Technique ◽

Photoluminescence Properties ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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