Large-area synthesis of monolayer MoSe2 films on SiO2/Si substrates by atmospheric pressure chemical vapor deposition
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We report the synthesis of large-area monolayer MoSe2 films extended up to a millimeter scale on SiO2/Si substrates by atmospheric pressure chemical vapor deposition (CVD).
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2012 ◽
Vol 22
(4)
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pp. 1498-1503
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2008 ◽
Vol 600-603
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pp. 875-878
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2016 ◽
Vol 59
(6)
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pp. 707-712
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1995 ◽
Vol 24
(6)
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pp. 761-766
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