Humic acid removal by gas–liquid interface discharge plasma: performance, mechanism and comparison to ozonation
2019 ◽
Vol 5
(1)
◽
pp. 152-160
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Keyword(s):
A novel advanced oxidation process (AOP) based on plasma in gas–liquid interface discharge was evaluated for humic acid removal. Much better performance was obtained compared to ozonation. The OH˙ radicals generated by reaction of in situ produced ozone and H2O2 during discharge process were mainly responsible for the removal.
2016 ◽
Vol 222
◽
pp. 1501-1509
◽
2002 ◽
Vol 46
(11-12)
◽
pp. 7-12
◽
2016 ◽
Vol 126
◽
pp. 1-8
◽
2018 ◽
Vol 338
◽
pp. 700-708
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Keyword(s):
2019 ◽
Vol 138
◽
pp. 36-40
◽
Keyword(s):
2021 ◽
Vol 779
◽
pp. 146498
Keyword(s):
2019 ◽
Vol 5
(11)
◽
pp. 1985-1992
◽
Keyword(s):