scholarly journals Low temperature atomic layer deposition of zirconium oxide for inkjet printed transistor applications

RSC Advances ◽  
2019 ◽  
Vol 9 (4) ◽  
pp. 1841-1848 ◽  
Author(s):  
Mohi Uddin Jewel ◽  
MD Shamim Mahmud ◽  
Mahmuda Akter Monne ◽  
Alex Zakhidov ◽  
Maggie Yihong Chen
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Zirconium Oxide ◽  
Gate Dielectric ◽  
Atomic Layer ◽  
Layer Deposition

We report the growth of zirconium oxide (ZrO2) as a high-k gate dielectric for an inkjet-printed transistor using a low-temperature atomic layer deposition (ALD) from tetrakis(dimethylamido)zirconium (TDMAZr) and water precursors.

Effect of Hydrogen on Hafnium Zirconium Oxide Fabricated by Atomic Layer Deposition Using H 2 O 2 Oxidant

2021 ◽  
pp. 2100020
Author(s):  
Hyoungkyu Kim ◽  
Seokjung Yun ◽  
Tae Ho Kim ◽  
Hoon Kim ◽  
Changdeuck Bae ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Zirconium Oxide ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals Low temperature temporal and spatial atomic layer deposition of TiO2 films

2015 ◽  
Vol 33 (4) ◽  
pp. 041512 ◽  
Author(s):  
Morteza Aghaee ◽  
Philipp S. Maydannik ◽  
Petri Johansson ◽  
Jurkka Kuusipalo ◽  
Mariadriana Creatore ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tio2 Films ◽  
Layer Deposition ◽  
Temporal And Spatial

Low Temperature Epitaxial Oxide Ultrathin Films and Nanostructures by Atomic Layer Deposition

2012 ◽  
Vol 24 (19) ◽  
pp. 3732-3737 ◽  
Author(s):  
Mariona Coll ◽  
Jaume Gazquez ◽  
Anna Palau ◽  
Maria Varela ◽  
Xavier Obradors ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Ultrathin Films ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Epitaxial Oxide
Sign in / Sign up

Export Citation Format

Share Document