scholarly journals Integrated Sustainability Analysis of Atomic Layer Deposition for Microelectronics Manufacturing

2010 ◽  
Vol 132 (3) ◽  
Author(s):  
Chris Y. Yuan ◽  
David A. Dornfeld
Keyword(s):  
Atomic Layer Deposition ◽  
Energy Flow ◽  
Scale Up ◽  
Atomic Layer ◽  
Development Stage ◽  
Layer Growth ◽  
Atomic Scale ◽  
Sustainability Analysis ◽  
Layer Deposition ◽  
Integrated Sustainability

Atomic layer deposition (ALD) is a promising nanotechnology for wide applications in microelectronics manufacturing due to its ability to control layer growth at atomic scale. Sustainability of ALD technology needs to be quantitatively investigated in this early development stage to improve its economic and environmental performance. In this paper, we present an integrated sustainability analysis of ALD technology through material and energy flow analyses. The study is performed on the ALD of Al2O3 high-κ dielectric film through trimethylaluminum and water binary reactions. The precursor utilizations, methane emissions, and nanowaste generations from the ALD process are all quantitatively studied. Energy flow analysis demonstrates that the ALD process energy consumption is mainly determined by the ALD cycle time rather than the process temperature. Scale-up performance of the ALD technology is also studied for both emission generations and energy consumptions. Strategies and methods for improving the sustainability performance of the ALD technology are suggested based on the analysis.

Experimental Measurement of Nano-Particle Emissions From Atomic Layer Deposition

2012 ◽  
Author(s):  
Jingwan Huo ◽  
Xiu Lin ◽  
Chris Yuan
Keyword(s):  
Atomic Layer Deposition ◽  
Manufacturing System ◽  
Atomic Layer ◽  
Layer Growth ◽  
Atomic Scale ◽  
Nano Particle ◽  
Scanning Mobility Particle Sizer ◽  
Experimental Conditions ◽  
Particle Emissions ◽  
Layer Deposition

Atomic layer deposition (ALD) is a key enabling nanotechnology for a broad array of applications due to its ability to grow conformal and pinhole-free thin films and control layer growth at atomic scale. Like many nanotechnologies, the potential amount of nano-particle emissions from ALD nano-manufacturing system is a significant concern for both occupational and public health exposure. Here we report our preliminary investigations of nano-particle emissions at end-of-the-pipe of ALD nano-manufacturing system. Scanning Mobility Particle Sizer (SMPS) spectrometer is used for the nano-particle measurement during the ALD process of Al2O3 high-k dielectric gate materials using Trimethyl Aluminum (TMA) and H2O binary reactions. Under various experimental conditions tested in our project, the results demonstrate that the aerosol nanoparticle emissions from ALD nano-manufacturing system are averaged with a mean diameter of 201.28 nm and 940,850 particle concentrations at 200 °C reaction temperature.

Atomic‐scale designing of zeolite‐based catalysts by atomic layer deposition

ChemPhysChem ◽  
2021 ◽  
Author(s):  
Dan Xu ◽  
Junqing Yin ◽  
Ya Gao ◽  
Di Zhu ◽  
Shuyuan Wang
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Atomic Scale ◽  
Layer Deposition

Atomic scale surface engineering of micro- to nano-sized pharmaceutical particles for drug delivery applications

Nanoscale ◽  
2017 ◽  
Vol 9 (32) ◽  
pp. 11410-11417 ◽  
Author(s):  
D. Zhang ◽  
M. J. Quayle ◽  
G. Petersson ◽  
J. R. van Ommen ◽  
S. Folestad
Keyword(s):  
Drug Delivery ◽  
Atomic Layer Deposition ◽  
Surface Engineering ◽  
Atomic Layer ◽  
Atomic Scale ◽  
Ambient Conditions ◽  
Surface Layers ◽  
Layer Deposition ◽  
Atomic Surface ◽  
Scale Surface

Few atomic surface layers via atomic layer deposition under near ambient conditions significantly altered dissolution and dispersion of pharmaceutical particles.

scholarly journals Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis

2021 ◽  
Author(s):  
Jerome W. F. Innocent ◽  
Mari Napari ◽  
Andrew L. Johnson ◽  
Thom R. Harris-Lee ◽  
Miriam Regue ◽  
...  
Keyword(s):  
Surface Modification ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Atomic Scale ◽  
Layer Deposition ◽  
Scale Surface

Here we report the development of a new scalable and transferable plasma assisted atomic layer deposition (PEALD) process for the production of uniform, conformal and pinhole free NiO with sub-nanometre control on a commercial ALD reactor.

scholarly journals USING OF ATOMIC LAYER DEPOSITION METHOD FOR OBTAINING THIN FILMS BASED ON LiMn2O4 AND LiFePO4

2020 ◽  
Vol 63 (9) ◽  
pp. 77-81
Author(s):  
Oksana Yu. Gants ◽  
Vladimir M. Kashkin ◽  
Angelina D. Yudina ◽  
Valentina O. Zhirnova ◽  
Anna S. Timonina ◽  
...  
Keyword(s):  
Thin Films ◽  
Phase Composition ◽  
Atomic Layer Deposition ◽  
Substrate Surface ◽  
Atomic Layer ◽  
Layer Growth ◽  
Process Temperature ◽  
Optimal Time ◽  
Influence Of Process Parameters ◽  
Layer Deposition

An approach to the synthesis of LiFePO4 and LiMn2O4 by atomic layer deposition is proposed and successfully implemented. The main regularities of the process are revealed and the method of synthesis realization is proposed. The following reagents were proposed and used: 2,2,6,6-tetramethylheptan-3,5 - dione of manganese, oxygen, iron (II) chloride, trimethyl phosphate, water and lithium tret-butylate. Nitrogen was used as an inert gas for purging the reactor and as a carrier gas. The influence of process parameters on the synthesis of thin films based on LiFePO4 and LiMn2O4 is described. It has been established that the phase composition of the resulting films is influenced by the time of precursor release and the process temperature. It is concluded that the increase in process temperature has a positive effect on the density of thin films of LiFePO4 and LiMn2O4. The optimum deposition temperature of LiFePO4 and LiMn2O4 is 400 ºC. It was shown that it is possible to regulate the content of each element and phase composition in films based on LiFePO4 and LiMn2O4 by changing the time of precursors release. The optimal time for the release of precursors for the synthesis of LiFePO4 and LiMn2O4 is 4 s under the stated conditions. Of great importance is the time of release of oxidizing agents-4 and 6 s for the deposition of LiFePO4 and LiMn2O4, respectively. The correlation of the layer growth rate per cycle was revealed, which was 0.2 nm/cycle for the synthesis of LiFePO4. The film obtained in the process is X-ray amorphous. To obtain the crystal structure, the films were annealed in argon at a temperature of 800 ºC. The mechanism of interaction of precursors with the substrate surface is studied. The influence of substrate activation on the uniformity of film growth is revealed.

scholarly journals Atomic Layer Deposition of Titanium Oxide on Single-Layer Graphene: An Atomic-Scale Study toward Understanding Nucleation and Growth

2017 ◽  
Vol 29 (5) ◽  
pp. 2232-2238 ◽  
Author(s):  
Yucheng Zhang ◽  
Carlos Guerra-Nuñez ◽  
Ivo Utke ◽  
Johann Michler ◽  
Piyush Agrawal ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Titanium Oxide ◽  
Single Layer ◽  
Atomic Layer ◽  
Nucleation And Growth ◽  
Atomic Scale ◽  
Single Layer Graphene ◽  
Layer Graphene ◽  
Layer Deposition

Toward Atomic-Scale Patterned Atomic Layer Deposition: Reactions of Al2O3 Precursors on a Si(001) Surface with Mixed Functionalizations

2016 ◽  
Vol 120 (5) ◽  
pp. 2628-2641 ◽  
Author(s):  
R. C. Longo ◽  
J. H. G. Owen ◽  
S. McDonnell ◽  
D. Dick ◽  
J. B. Ballard ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Atomic Scale ◽  
Layer Deposition

scholarly journals Investigations on the Electrochemical Atomic Layer Growth of Bi2Se3 and the Surface Limited Deposition of Bismuth at the Silver Electrode

Materials ◽  
2018 ◽  
Vol 11 (8) ◽  
pp. 1426 ◽  
Author(s):  
Walter Giurlani ◽  
Andrea Giaccherini ◽  
Nicola Calisi ◽  
Giovanni Zangari ◽  
Emanuele Salvietti ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Ultrathin Films ◽  
Photoelectron Spectroscopy ◽  
Atomic Layer ◽  
Layer Growth ◽  
Electrochemical Studies ◽  
Optimal Conditions ◽  
X Ray ◽  
Layer Deposition ◽  
Controlled Deposition

The Electrochemical Atomic Layer Deposition (E-ALD) technique is used for the deposition of ultrathin films of bismuth (Bi) compounds. Exploiting the E-ALD, it was possible to obtain highly controlled nanostructured depositions as needed, for the application of these materials for novel electronics (topological insulators), thermoelectrics and opto-electronics applications. Electrochemical studies have been conducted to determine the Underpotential Deposition (UPD) of Bi on selenium (Se) to obtain the Bi2Se3 compound on the Ag (111) electrode. Verifying the composition with X-ray Photoelectron Spectroscopy (XPS) showed that, after the first monolayer, the deposition of Se stopped. Thicker deposits were synthesized exploiting a time-controlled deposition of massive Se. We then investigated the optimal conditions to deposit a single monolayer of metallic Bi directly on the Ag.

scholarly journals Atomic Layer Deposition of Inorganic Films for the Synthesis of Vertically Aligned Carbon Nanotube Arrays and Their Hybrids

Coatings ◽  
2019 ◽  
Vol 9 (12) ◽  
pp. 806
Author(s):  
Guang-Jie Yuan ◽  
Jie-Fei Xie ◽  
Hao-Hao Li ◽  
Hong-Liang Lu ◽  
Ying-Zhong Tian
Keyword(s):  
Thin Films ◽  
Carbon Nanotube ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Atomic Scale ◽  
Nanotube Arrays ◽  
Aspect Ratios ◽  
Carbon Nanotube Arrays ◽  
Layer Deposition ◽  
Vertically Aligned

Vertically aligned carbon nanotube arrays (VACNTs) have many excellent properties and show great potential for various applications. Recently, there has been a desire to grow VACNTs on nonplanar surfaces and synthesize core-sheath-structured VACNT–inorganic hybrids. To achieve this aim, atomic layer deposition (ALD) has been extensively applied, especially due to its atomic-scale thickness controllability and excellent conformality of films on three-dimensional (3D) structures with high aspect ratios. In this paper, the ALD of catalyst thin films for the growth of VACNTs, such as Co3O4, Al2O3, and Fe2O3, was first mentioned. After that, the ALD of thin films for the synthesis of VACNT–inorganic hybrids was also discussed. To highlight the importance of these hybrids, their potential applications in supercapacitors, solar cells, fuel cells, and sensors have also been reviewed.

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