scholarly journals Photolithography in the vacuum ultraviolet (172 nm) with sub-400 nm resolution: photoablative patterning of nanostructures and optical components in bulk polymers and thin films on semiconductors

Nanoscale ◽  
2020 ◽  
Vol 12 (32) ◽  
pp. 16796-16804
Author(s):  
Andrey E. Mironov ◽  
Jinhong Kim ◽  
Yin Huang ◽  
Austin W. Steinforth ◽  
Dane J. Sievers ◽  
...  
Keyword(s):  
Thin Films ◽  
Vacuum Ultraviolet ◽  
Optical Components ◽  
Bulk Polymers

Precision photoablation of bulk polymers or films with incoherent 172 nm radiation from flat, microplasma array-powered lamps provides the foundation for a photolithographic process in which an acrylic or other polymer serves as a dry photoresist.

Surface modification of polymeric thin films with vacuum ultraviolet light

2008 ◽  
Vol 40 (3-4) ◽  
pp. 400-403 ◽  
Author(s):  
E. Sarantopoulou ◽  
J. Kovač ◽  
Z. Kollia ◽  
I. Raptis ◽  
S. Kobe ◽  
...  
Keyword(s):  
Thin Films ◽  
Surface Modification ◽  
Ultraviolet Light ◽  
Vacuum Ultraviolet ◽  
Polymeric Thin Films

Optical Absorption and Vacuum-Ultraviolet Reflectance of GaN Thin Films

1970 ◽  
Vol 24 (25) ◽  
pp. 1421-1423 ◽  
Author(s):  
B. B. Kosicki ◽  
R. J. Powell ◽  
J. C. Burgiel
Keyword(s):  
Thin Films ◽  
Optical Absorption ◽  
Vacuum Ultraviolet ◽  
Ultraviolet Reflectance

Photoabsorption cross section of C70 thin films from visible to vacuum ultraviolet

2009 ◽  
Vol 130 (23) ◽  
pp. 234510 ◽  
Author(s):  
H. Yagi ◽  
K. Nakajima ◽  
K. R. Koswattage ◽  
K. Nakagawa ◽  
H. Katayanagi ◽  
...  
Keyword(s):  
Thin Films ◽  
Cross Section ◽  
Vacuum Ultraviolet ◽  
Photoabsorption Cross Section

scholarly journals Deposition of fluoropolymer thin films by vacuum-ultraviolet laser ablation.

1994 ◽  
Vol 7 (2) ◽  
pp. 373-380 ◽  
Author(s):  
SHINGO INOUE ◽  
TAKEO FUJII ◽  
YOSHIAKI UENO ◽  
FUMIHITKO KANNARI
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Vacuum Ultraviolet ◽  
Ultraviolet Laser ◽  
Vacuum Ultraviolet Laser

Extrinsic time-dependent dielectric breakdown of low-k organosilicate thin films from vacuum-ultraviolet irradiation

2017 ◽  
Vol 35 (2) ◽  
pp. 021509 ◽  
Author(s):  
Xiangyu Guo ◽  
Dongfei Pei ◽  
Huifeng Zheng ◽  
Weiyi Li ◽  
J. Leon Shohet ◽  
...  
Keyword(s):  
Thin Films ◽  
Ultraviolet Irradiation ◽  
Vacuum Ultraviolet ◽  
Dielectric Breakdown ◽  
Time Dependent ◽  
Time Dependent Dielectric Breakdown ◽  
Organosilicate Thin Films ◽  
Low K

Photoreactions in Polyalkylsilynes Induced by ArF-Laser Irradiation

1990 ◽  
Vol 204 ◽  
Author(s):  
R. R. Kunz ◽  
P. A. Bianconi ◽  
M. W. Horn ◽  
D. A. Smith ◽  
C. A. Freed
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Laser Irradiation ◽  
Alkyl Group ◽  
Optical Components ◽  
X Ray ◽  
Oxygen Coordination ◽  
Bond Scission ◽  
Deep Uv ◽  
193 Nm

ABSTRACTPhotoreactions in polyalkylsilyne thin films induced by ArFlaser (193 nm) irradiation have been examined. Photoexcitation of the σ-conjugated Si-network at 193 nm (6.42 eV) results in Si-Si bond scission and alkyl-group desorption when irradiated in a vacuum. In addition to these processes, efficient (up to 7% quantum efficiency) insertion of oxygen into the Si backbone occurs when the irradiation is performed in air, resulting in the formation of a siloxane. Both infrared and X-ray photoelectron spectroscopies indicate a higher oxygen coordination about the Si atoms in the oxidized product than observed for linear polysilanes. This higher oxygen coordination indicates a siloxane network. The polysilynes have been demonstrated as deep UV photoresists and may have additional applications as precursors for thin film or binary optical components.

Vacuum ultraviolet driven chemical vapor deposition of localized aluminum thin films

1983 ◽  
Vol 1 (2) ◽  
pp. 534-536 ◽  
Author(s):  
A. R. Calloway ◽  
T. A. Galantowicz ◽  
W. R. Fenner
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Vacuum Ultraviolet ◽  
Chemical Vapor

Characterization of thin films and bulk materials for DUV optical components

2006 ◽  
Author(s):  
Sven Schröder ◽  
Mathias Kamprath ◽  
Angela Duparré
Keyword(s):  
Thin Films ◽  
Bulk Materials ◽  
Optical Components
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