Comment on “Ultralow magnetostrictive flexible ferromagnetic nanowires” by G. Muscas, P. E. Jönsson, I. G. Serrano, Ö. Vallin, and M. V. Kamalakar, Nanoscale, 2021, 13, 6043–6052
Keyword(s):
A strain field (εxx) in Ti/Co/Al nanowires on the PEN substrate subjected to uniaxial stress. The applied stress perpendicular to the nanowire length leads to very low strain in nanowires (about 30 times lower than the macroscopic strain).
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