Field emission in lateral silicon diode fabricated by atomic force microscopy lithography

2012 ◽  
Vol 48 (12) ◽  
pp. 712 ◽  
Author(s):  
J. Rouhi ◽  
S. Mahmud ◽  
S.D. Hutagalung ◽  
N. Naderi
Keyword(s):  
Atomic Force Microscopy ◽  
Field Emission ◽  
Force Microscopy ◽  
Silicon Diode ◽  
Atomic Force

Comparative Study of Field Emission-Scanning Electron Microscopy and Atomic Force Microscopy to Assess Self-assembled Monolayer Coverage on Any Type of Substrate

1999 ◽  
Vol 5 (6) ◽  
pp. 413-419 ◽  
Author(s):  
Bernardo R.A. Neves ◽  
Michael E. Salmon ◽  
Phillip E. Russell ◽  
E. Barry Troughton
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Atomic Force Microscopy ◽  
Comparative Study ◽  
Field Emission ◽  
Self Assembled Monolayer ◽  
Force Microscopy ◽  
Atomic Force ◽  
Self Assembled ◽  
Scanning Electron

Abstract: In this work, we show how field emission–scanning electron microscopy (FE-SEM) can be a useful tool for the study of self-assembled monolayer systems. We have carried out a comparative study using FE-SEM and atomic force microscopy (AFM) to assess the morphology and coverage of self-assembled monolayers (SAM) on different substrates. The results show that FE-SEM images present the same qualitative information obtained by AFM images when the SAM is deposited on a smooth substrate (e.g., mica). Further experiments with rough substrates (e.g., Al grains on glass) show that FE-SEM is capable of unambiguously identifying SAMs on any type of substrate, whereas AFM has significant difficulties in identifying SAMs on rough surfaces.

Morphology of Low Temperature Carbon Films Prepared by VHF CVD: Correlation with Field Emission

1998 ◽  
Vol 509 ◽  
Author(s):  
A.N. Titkov ◽  
A.I. Kosarev ◽  
A.J. Vinogradov ◽  
Z. Waqar ◽  
I.V. Makarenko ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Low Temperature ◽  
Field Emission ◽  
Significant Influence ◽  
Substrate Surface ◽  
Carbon Films ◽  
Emission Characteristics ◽  
Force Microscopy ◽  
Atomic Force ◽  
Deposition Parameters

AbstractThe effect of deposition parameters and substrate on the morphology of carbon films prepared in VHF plasma at low temperature has been studied by Atomic Force Microscopy. Carbon films demonstrating superior emission characteristics were the smoothest, but not all of the smoothest films demonstrated good emission. Significant influence of pre-growth treatment of the substrate surface on the emission characteristics of the films was found.

Some aspects of pulsed laser deposited nanocrystalline LaB6 film: atomic force microscopy, constant force current imaging and field emission investigations

2008 ◽  
Vol 19 (26) ◽  
pp. 265605 ◽  
Author(s):  
Dattatray J Late ◽  
Kalyani S Date ◽  
Mahendra A More ◽  
Pankaj Misra ◽  
B N Singh ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Field Emission ◽  
Pulsed Laser ◽  
Constant Force ◽  
Force Microscopy ◽  
Atomic Force

Field emission observed from metal-diamond junctions revealed by atomic force microscopy

2007 ◽  
Vol 90 (24) ◽  
pp. 242109 ◽  
Author(s):  
S. A. Furkert ◽  
A. Wotherspoon ◽  
D. Cherns ◽  
N. A. Fox ◽  
G. M. Fuge ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Field Emission ◽  
Force Microscopy ◽  
Atomic Force

Electrical and Structural Properties of ZnO/TiO2 Nanocomposite Thin Films by RF Magnetron Co-Sputtering

2013 ◽  
Vol 667 ◽  
pp. 206-212 ◽  
Author(s):  
I. Saurdi ◽  
Mohamad Hafiz Mamat ◽  
Mohamad Rusop
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Scanning Electron Microscopy ◽  
Atomic Force Microscopy ◽  
Field Emission ◽  
Deposition Time ◽  
Force Microscopy ◽  
Atomic Force ◽  
Nanocomposite Thin Films ◽  
Scanning Electron

In this study, the ZnO/TiO2 nanocomposite thin films were prepared by RF Magnetron co-sputtering ZnO and TiO2 targets at different deposition times from 30-75 minutes. The electrical and structural properties ZnO/TiO2 nanocomposite thin films were characterized by I-V measurement, atomic force microscopy (AFM) and field emission scanning electron microscopy (FE-SEM). The electrical characteristics of nanocomposite films revealed that the conductivity of thin films increases as the thickness increase due to the improvement in surface contact between particles as well as photocatalytic activity. High conductivity at 1.67x10-4 S/cm and lowest resistivity about 5.14x104 Ω/cm were obtained for 75 minutes deposition time. Atomic force microscopy (AFM) showed particle size of ZnO/TiO2 thin films varied from 27nm to 51nm with an increasing in deposition time with granular shapes structures were observed from field emission scanning electron microscopy (FE-SEM).

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