ELECTRON-IMPACT BROADENING OF Cu IV LINES FOR THE DIAGNOSTIC OF THE ARC PLASMA OF ELECTRODYNAMIC MACRO-PARTICLE ACCELERATOR

1989 ◽  
Vol 50 (C1) ◽  
pp. C1-623-C1-626
Author(s):  
M. S. DIMITRIJEVIC ◽  
Z. D. JURIC ◽  
A. A. MIHAJLOV
2005 ◽  
Vol 107 ◽  
pp. 63-68
Author(s):  
Ian G. Brown

Vacuum arc plasma can be formed using particularly uncomplicated hardware, providing a means for laboratory scale formation of dense and highly-ionized metal plasma. The simplicity and versatility of the approach has led to its widespread use in recent times for both fundamental and technological applications. When embodied in a plasma gun configuration, the source can provide a valuable tool for plasma deposition of metal and metal-containing thin films, including in plasma immersion configurations. When embodied in an ion source configuration, high current beams of metal ions can be formed, and such beams have found good use for ion implantation and particle accelerator injection. Here we briefly review vacuum arc plasma guns and ion sources, outlining some of the hardware embodiments that have been developed at Berkeley and used for various materials modification applications.


Author(s):  
Raynald Gauvin ◽  
Gilles L'Espérance

Values of cross sections for ionization of inner-shell electrons by electron impact are required for electron probe microanalysis, Auger-electron spectroscopy and electron energy-loss spectroscopy. In this work, the results of the measurement of inner-shell ionization cross-sections by electron impact, Q, in a TEM are presented for the K shell.The measurement of QNi has been performed at 120 KeV in a TEM by measuring the net X-ray intensity of the Kα line of Ni, INi, which is related to QNi by the relation :(1)where i is the total electron dose, (Ω/4π)is the fractional solid angle, ω is the fluorescence yield, α is the relative intensity factor, ε is the Si (Li) detector efficiency, A is the atomic weight, ρ is the sample density, No is Avogadro's number, t' is the distance traveled by the electrons in the specimen which is equal to τ sec θ neglecting beam broadening where τ is the specimen thickness and θ is the angle between the electron beam and the normal of the thin foil and CNi is the weight fraction of Ni.


1980 ◽  
Vol 77 ◽  
pp. 773-777 ◽  
Author(s):  
F.J. de Heer ◽  
H.A. Van Sprang ◽  
G.R. Mohlmann

1993 ◽  
Vol 03 (C6) ◽  
pp. C6-117-C6-123 ◽  
Author(s):  
M. J. FORD ◽  
J. P. DOERING ◽  
J. W. COOPER ◽  
M. A. COPLAN ◽  
J. H. MOORE

2001 ◽  
Vol 11 (PR2) ◽  
pp. Pr2-309-Pr2-312
Author(s):  
K. M. Aggarwal ◽  
F. P. Keenan ◽  
S. J. Rose

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