High quality fluorinated silicon oxide films prepared by plasma enhanced chemical vapor deposition at 120 °C
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1997 ◽
Vol 15
(5)
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pp. 1843
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1998 ◽
Vol 332
(1-2)
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pp. 369-374
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2003 ◽
Vol 444
(1-2)
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pp. 125-131
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2000 ◽
Vol 39
(Part 1, No. 1)
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pp. 330-336
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1985 ◽
Vol 132
(2)
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pp. 482-488
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2006 ◽
Vol 24
(2)
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pp. 291-295
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1985 ◽
Vol 3
(6)
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pp. 1604
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