Effect of Radio Frequency Power on the Properties of Hydrogenated Amorphous Carbon Films Grown by Radio Frequency Plasma-Enhanced Chemical Vapor Deposition

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Radio Frequency Plasma ◽

Amorphous Carbon Films ◽

Frequency Plasma ◽

Hydrogenated Amorphous ◽

Frequency Power

Spectroscopic properties of nitrogen doped hydrogenated amorphous carbon films grown by radio frequency plasma-enhanced chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1371268 ◽

2001 ◽

Vol 89 (12) ◽

pp. 7924-7931 ◽

Cited By ~ 44

Author(s):

Y. Hayashi ◽

G. Yu ◽

M. M. Rahman ◽

K. M. Krishna ◽

T. Soga ◽

...

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Spectroscopic Properties ◽

Carbon Films ◽

Radio Frequency Plasma ◽

Amorphous Carbon Films ◽

Nitrogen Doped ◽

Frequency Plasma ◽

Fabrication and Characteristics of Amorphous Carbon Films Grown in Pure Methane Plasma by using Radio Frequency Plasma Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.42.1744 ◽

2003 ◽

Vol 42 (Part 1, No. 4A) ◽

pp. 1744-1748 ◽

Cited By ~ 9

Author(s):

Kyung-Jea Cho ◽

Jeong-Tak Ryu ◽

Yang-Gyu Baek ◽

Takashi Ikuno ◽

Shin-ichi Honda ◽

...

Keyword(s):

Radio Frequency ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Radio Frequency Plasma ◽

Amorphous Carbon Films ◽

Frequency Plasma ◽

Pure Methane

Physical and Microstructural Properties of Radio-Frequency Plasma-Enhanced Chemical Vapor Deposition Grown n-Type Phosphorus Doped Amorphous Carbon Films on the Contribution to Carbon-Based Solar Cells

Japanese Journal of Applied Physics ◽

10.1143/jjap.44.6124 ◽

2005 ◽

Vol 44 (8) ◽

pp. 6124-6130 ◽

Cited By ~ 8

Author(s):

Mohamad Rusop ◽

Hiroshi Ebisu ◽

Mitsuhiro Adachi ◽

Tetsuo Soga ◽

Takashi Jimbo

Keyword(s):

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Radio Frequency Plasma ◽

Microstructural Properties ◽

Amorphous Carbon Films ◽

Frequency Plasma ◽

Phosphorus Doped

Positive and negative direct current bias effects on the microstructures and physical properties of hydrogenated amorphous carbon films prepared by radio frequency plasma chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579398 ◽

1995 ◽

Vol 13 (2) ◽

pp. 195-199 ◽

Cited By ~ 15

Author(s):

Masatoshi Nakayama ◽

Atsuhiro Tsuyoshi ◽

Masanori Shibahara ◽

Kazunori Maruyama ◽

Kiichiro Kamata

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Radio Frequency Plasma ◽

Plasma Chemical ◽

Amorphous Carbon Films ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Bias ◽

Frequency Plasma ◽

Structure of amorphous hydrogenated carbon films prepared by radio frequency plasma enhanced chemical vapor deposition. An analogy with the structure zone model developed for metals

Journal of Applied Physics ◽

10.1063/1.1518795 ◽

2002 ◽

Vol 92 (11) ◽

pp. 6572-6581 ◽

Cited By ~ 16

Author(s):

B. Dumay ◽

E. Finot ◽

M. Theobald ◽

O. Legaie ◽

J. Durand ◽

...

Keyword(s):

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Zone Model ◽

Radio Frequency Plasma ◽

Frequency Plasma ◽

Amorphous Hydrogenated Carbon

In-situ doping of erbium in hydrogenated amorphous carbon by low temperature metalorganic radio frequency plasma enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2014.02.038 ◽

2014 ◽

Vol 570 ◽

pp. 429-435 ◽

Cited By ~ 3

Author(s):

Hui-Lin Hsu ◽

Keith R. Leong ◽

Michael Halamicek ◽

I-Ju Teng ◽

Pratish Mahtani ◽

...

Keyword(s):

Low Temperature ◽

Radio Frequency ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Frequency Plasma ◽

Features of hydrogenated amorphous silicon films developed under an unexplored region of parameter space of radio-frequency plasma-enhanced chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.126339 ◽

2000 ◽

Vol 76 (17) ◽

pp. 2340-2342 ◽

Cited By ~ 6

Author(s):

Sukti Hazra ◽

A. R. Middya ◽

C. Longeaud ◽

Swati Ray

Keyword(s):

Radio Frequency ◽

Amorphous Silicon ◽

Parameter Space ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Frequency Plasma ◽

Synthesis of carbon nanosheets by inductively coupled radio-frequency plasma enhanced chemical vapor deposition

Carbon ◽

10.1016/j.carbon.2004.06.035 ◽

2004 ◽

Vol 42 (14) ◽

pp. 2867-2872 ◽

Cited By ~ 332

Author(s):

Jianjun Wang ◽

Mingyao Zhu ◽

Ron A. Outlaw ◽

Xin Zhao ◽

Dennis M. Manos ◽

...

Keyword(s):

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Carbon Nanosheets ◽

Inductively Coupled ◽

Frequency Plasma

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

Effect of thermodynamic parameters on properties of silicon-carbon films prepared by radio-frequency plasma-enhanced chemical vapor deposition for anti-reflective and photo-luminescent coatings

10.1116/6.0001052 ◽

2021 ◽

Vol 39 (4) ◽

pp. 042203

Author(s):

William W. Hernández-Montero ◽

Adrián Itzmoyotl-Toxqui ◽

Carlos Zúñiga-Islas

Keyword(s):

Thermodynamic Parameters ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Radio Frequency Plasma ◽

Silicon Carbon ◽

Frequency Plasma ◽

Photo Luminescent ◽

Luminescent Coatings

GROWING CARBON BUCKONIONS BY RADIO FREQUENCY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION

Acta Physica Sinica ◽

10.7498/aps.50.1264 ◽

2001 ◽

Vol 50 (7) ◽

pp. 1264

Author(s):

CHEN XIAO-HUA ◽

WU GUO-TAO ◽

DENG FU-MING ◽

WANG JIAN-XIONG ◽

YANG HANG-SHENG ◽

...

Keyword(s):

Radio Frequency ◽

Vapor Deposition ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Frequency Plasma