scholarly journals Low-temperature formation of silicon nitride gate dielectrics by atomic-layer deposition

2001 ◽  
Vol 79 (5) ◽  
pp. 665-667 ◽  
Author(s):  
Anri Nakajima ◽  
Takashi Yoshimoto ◽  
Toshirou Kidera ◽  
Shin Yokoyama
Keyword(s):  
Silicon Nitride ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Gate Dielectrics ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers

2015 ◽  
Vol 7 (40) ◽  
pp. 22525-22532 ◽  
Author(s):  
Anne-Marije Andringa ◽  
Alberto Perrotta ◽  
Koen de Peuter ◽  
Harm C. M. Knoops ◽  
Wilhelmus M. M. Kessels ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Barrier Layers ◽  
Layer Deposition

Role of Trimethylaluminum in Low Temperature Atomic Layer Deposition of Silicon Nitride

2017 ◽  
Vol 29 (14) ◽  
pp. 6022-6029 ◽  
Author(s):  
Aaron Dangerfield ◽  
Charith E. Nanayakkara ◽  
Anupama Mallikarjunan ◽  
Xinjian Lei ◽  
Ronald M. Pearlstein ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition

Evaluation of silicon tetrahalide precursors for low-temperature thermal atomic layer deposition of silicon nitride

2021 ◽  
pp. 150603
Author(s):  
Neung-Kyung Yu ◽  
Chan Hui Moon ◽  
Jeongwoo Park ◽  
Han-Bo-Ram Lee ◽  
Bonggeun Shong
Keyword(s):  
Silicon Nitride ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition

Electrical properties of 0.5 nm thick Hf-silicate top‐layer∕HfO2 gate dielectrics by atomic layer deposition

2005 ◽  
Vol 86 (22) ◽  
pp. 222904 ◽  
Author(s):  
Satoshi Kamiyama ◽  
Takayoshi Miura ◽  
Yasuo Nara ◽  
Tsunetoshi Arikado
Keyword(s):  
Electrical Properties ◽  
Atomic Layer Deposition ◽  
Gate Dielectrics ◽  
Atomic Layer ◽  
Layer Deposition
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