Performance and Stability Enhancement of In–Sn–Zn–O TFTs Using SiO2 Gate Dielectrics Grown by Low Temperature Atomic Layer Deposition

2017 ◽  
Vol 9 (49) ◽  
pp. 42928-42934 ◽  
Author(s):  
Jiazhen Sheng ◽  
Ju-Hwan Han ◽  
Wan-Ho Choi ◽  
Jozeph Park ◽  
Jin-Seong Park
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Gate Dielectrics ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Stability Enhancement

scholarly journals Low-temperature formation of silicon nitride gate dielectrics by atomic-layer deposition

2001 ◽  
Vol 79 (5) ◽  
pp. 665-667 ◽  
Author(s):  
Anri Nakajima ◽  
Takashi Yoshimoto ◽  
Toshirou Kidera ◽  
Shin Yokoyama
Keyword(s):  
Silicon Nitride ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Gate Dielectrics ◽  
Atomic Layer ◽  
Layer Deposition

Electrical properties of 0.5 nm thick Hf-silicate top‐layer∕HfO2 gate dielectrics by atomic layer deposition

2005 ◽  
Vol 86 (22) ◽  
pp. 222904 ◽  
Author(s):  
Satoshi Kamiyama ◽  
Takayoshi Miura ◽  
Yasuo Nara ◽  
Tsunetoshi Arikado
Keyword(s):  
Electrical Properties ◽  
Atomic Layer Deposition ◽  
Gate Dielectrics ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals Low temperature temporal and spatial atomic layer deposition of TiO2 films

2015 ◽  
Vol 33 (4) ◽  
pp. 041512 ◽  
Author(s):  
Morteza Aghaee ◽  
Philipp S. Maydannik ◽  
Petri Johansson ◽  
Jurkka Kuusipalo ◽  
Mariadriana Creatore ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tio2 Films ◽  
Layer Deposition ◽  
Temporal And Spatial

Low Temperature Epitaxial Oxide Ultrathin Films and Nanostructures by Atomic Layer Deposition

2012 ◽  
Vol 24 (19) ◽  
pp. 3732-3737 ◽  
Author(s):  
Mariona Coll ◽  
Jaume Gazquez ◽  
Anna Palau ◽  
Maria Varela ◽  
Xavier Obradors ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Ultrathin Films ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Epitaxial Oxide
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