Measurement of Si, SiF, and SiF2 radicals and SiF4 molecule using very high frequency capacitively coupled plasma employing SiF4

2003 ◽  
Vol 94 (3) ◽  
pp. 1428-1435 ◽  
Author(s):  
Takayuki Ohta ◽  
Ken-ichiro Hara ◽  
Tetsuro Ishida ◽  
Masaru Hori ◽  
Toshio Goto ◽  
...  
2003 ◽  
Vol 42 (Part 2, No. 12B) ◽  
pp. L1532-L1534 ◽  
Author(s):  
Takayuki Ohta ◽  
Masaru Hori ◽  
Tetsuro Ishida ◽  
Toshio Goto ◽  
Masafumi Ito ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document