Relationship between center-peaked plasma density profiles and harmonic electromagnetic waves in very high frequency capacitively coupled plasma reactors

2014 ◽  
Vol 53 (3S2) ◽  
pp. 03DB01 ◽  
Author(s):  
Ikuo Sawada ◽  
Peter L. G. Ventzek ◽  
Barton Lane ◽  
Tatsuro Ohshita ◽  
Rochan R. Upadhyay ◽  
...  
Keyword(s):  
Plasma Density ◽  
High Frequency ◽  
Electromagnetic Waves ◽  
Plasma Reactors ◽  
Very High Frequency ◽  
Density Profiles ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma ◽  
Very High

Measurement of Si, SiF, and SiF2 radicals and SiF4 molecule using very high frequency capacitively coupled plasma employing SiF4

2003 ◽  
Vol 94 (3) ◽  
pp. 1428-1435 ◽  
Author(s):  
Takayuki Ohta ◽  
Ken-ichiro Hara ◽  
Tetsuro Ishida ◽  
Masaru Hori ◽  
Toshio Goto ◽  
...  
Keyword(s):  
High Frequency ◽  
Very High Frequency ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma ◽  
Very High

Effects of Driving Frequency on the Translational Temperature and Absolute Density of Si Atoms in Very High Frequency Capacitively Coupled SiF4Plasmas

2003 ◽  
Vol 42 (Part 2, No. 12B) ◽  
pp. L1532-L1534 ◽  
Author(s):  
Takayuki Ohta ◽  
Masaru Hori ◽  
Tetsuro Ishida ◽  
Toshio Goto ◽  
Masafumi Ito ◽  
...  
Keyword(s):  
High Frequency ◽  
Driving Frequency ◽  
Very High Frequency ◽  
Capacitively Coupled ◽  
Translational Temperature ◽  
Absolute Density ◽  
Very High
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