High capacitance density metal-insulator-metal structure based on Al2O3–HfTiO nanolaminate stacks

2007 ◽  
Vol 90 (1) ◽  
pp. 013506 ◽  
Author(s):  
V. Mikhelashvili ◽  
G. Eisenstein ◽  
A. Lahav
Keyword(s):  
Metal Structure ◽  
Metal Insulator ◽  
Capacitance Density ◽  
High Capacitance ◽  
Metal Insulator Metal

Metal-insulator-metal capacitor with high capacitance density and low leakage current using ZrTiO4 film

2009 ◽  
Vol 95 (11) ◽  
pp. 113502 ◽  
Author(s):  
Yung-Hsien Wu ◽  
Bo-Yu Chen ◽  
Lun-Lun Chen ◽  
Jia-Rong Wu ◽  
Min-Lin Wu
Keyword(s):  
Leakage Current ◽  
Metal Insulator ◽  
Capacitance Density ◽  
High Capacitance ◽  
Low Leakage ◽  
Low Leakage Current ◽  
Metal Insulator Metal

New Stacked Metal–Insulator–Metal Capacitor with High Capacitance Density for Future InP-Based ICs

2011 ◽  
Vol 50 (4S) ◽  
pp. 04DF09 ◽  
Author(s):  
Takuya Tsutsumi ◽  
Suehiro Sugitani ◽  
Kazumi Nishimura ◽  
Minoru Ida
Keyword(s):  
Metal Insulator ◽  
Capacitance Density ◽  
High Capacitance ◽  
Metal Insulator Metal

New Stacked Metal–Insulator–Metal Capacitor with High Capacitance Density for Future InP-Based ICs

2011 ◽  
Vol 50 (4) ◽  
pp. 04DF09 ◽  
Author(s):  
Takuya Tsutsumi ◽  
Suehiro Sugitani ◽  
Kazumi Nishimura ◽  
Minoru Ida
Keyword(s):  
Metal Insulator ◽  
Capacitance Density ◽  
High Capacitance ◽  
Metal Insulator Metal

High capacitance density metal-insulator-metal structures based on a high-κ HfNxOy–SiO2–HfTiOy laminate stack

2008 ◽  
Vol 92 (13) ◽  
pp. 132902 ◽  
Author(s):  
V. Mikhelashvili ◽  
P. Thangadurai ◽  
W. D. Kaplan ◽  
G. Eisenstein
Keyword(s):  
Metal Insulator ◽  
Capacitance Density ◽  
Metal Structures ◽  
High Capacitance ◽  
Metal Insulator Metal

Dielectric Relaxation and Reliability of Al2O3-HfO2-Al2O3 Sandwiched Metal-Insulator-Metal (MIM) Capacitor

2013 ◽  
Vol 658 ◽  
pp. 116-119
Author(s):  
Ho Young Kwak ◽  
Hyuk Min Kwon ◽  
Sung Kyu Kwon ◽  
Jae Hyung Jang ◽  
Seung Yong Sung ◽  
...  
Keyword(s):  
Dielectric Relaxation ◽  
Charge Trapping ◽  
Dissipation Factor ◽  
Metal Insulator ◽  
Capacitance Density ◽  
High Capacitance ◽  
Voltage Coefficient ◽  
Low Dissipation ◽  
Metal Insulator Metal ◽  
Sandwiched Structure

. In this paper, dielectric relaxation and reliability of high capacitance density metal-insulator-metal (MIM) capacitor using Al2O3-HfO2-Al2O3 sandwiched structure were analyzed. It is shown that multilayer MIM capacitor provides high capacitance density and low dissipation factor at room temperature. The dielectric relaxation voltage shows little dependence on the capacitor area. The capacitance density (C0) increases and quadratic voltage coefficient (α) decreases as a function of stress time under constant voltage stress (CVS) because of the charge trapping effect in the high-k dielectric.

Transmission characteristics and applications of plasmonic slit waveguide based on metal-insulator-metal structure

2012 ◽  
Vol 51 (10) ◽  
pp. 104601-1 ◽  
Author(s):  
Kunhua Wen ◽  
Lianshan Yan ◽  
Wei Pan ◽  
Bin Luo ◽  
Zhen Guo ◽  
...  
Keyword(s):  
Metal Structure ◽  
Transmission Characteristics ◽  
Metal Insulator ◽  
Metal Insulator Metal

Narrow-Band Filter of Surface Plasmon Based on Dual-Section Metal-Insulator-Metal Structure

2013 ◽  
Vol 33 (11) ◽  
pp. 1123003
Author(s):  
罗昕 Luo Xin ◽  
邹喜华 Zou Xihua ◽  
温坤华 Wen Kunhua ◽  
潘炜 Pan Wei ◽  
闫连山 Yan Lianshan ◽  
...  
Keyword(s):  
Surface Plasmon ◽  
Narrow Band ◽  
Metal Structure ◽  
Metal Insulator ◽  
Band Filter ◽  
Metal Insulator Metal ◽  
Narrow Band Filter

Greatly enhanced electric field by the improved metal–insulator–metal structure in the visible region

2019 ◽  
Vol 30 (32) ◽  
pp. 32LT01
Author(s):  
Shiwei Shu ◽  
Chengping Huang ◽  
Meng Zhang ◽  
Yan Yan
Keyword(s):  
Electric Field ◽  
Visible Region ◽  
Metal Structure ◽  
Metal Insulator ◽  
Metal Insulator Metal
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