New Stacked Metal–Insulator–Metal Capacitor with High Capacitance Density for Future InP-Based ICs
2011 ◽
Vol 50
(4S)
◽
pp. 04DF09
◽
Keyword(s):
Keyword(s):
2010 ◽
Vol 87
(2)
◽
pp. 144-149
◽
2011 ◽
Vol 50
(4)
◽
pp. 04DF09
◽
Keyword(s):
2007 ◽
Vol 154
(10)
◽
pp. G220
◽
2021 ◽