Atomic layer deposition of high capacitance density Ta2O5–ZrO2 based dielectrics for metal–insulator–metal structures

Microelectronic Engineering ◽

10.1016/j.mee.2009.06.032 ◽

2010 ◽

Vol 87 (2) ◽

pp. 144-149 ◽

Author(s):

Indrek Jõgi ◽

Kaupo Kukli ◽

Mikko Ritala ◽

Markku Leskelä ◽

Jaan Aarik ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Metal Insulator ◽

Capacitance Density ◽

Metal Structures ◽

High Capacitance ◽

Layer Deposition ◽

Metal Insulator Metal

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Field-enhanced direct tunneling in ultrathin atomic-layer-deposition-grown Au−Al2O3 -Cr metal-insulator-metal structures

Physical Review B ◽

10.1103/physrevb.96.115435 ◽

2017 ◽

Vol 96 (11) ◽

Author(s):

L. Fry-Bouriaux ◽

M. C. Rosamond ◽

D. A. Williams ◽

A. G. Davies ◽

C. Wälti

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Metal Insulator ◽

Metal Structures ◽

Direct Tunneling ◽

Layer Deposition ◽

Metal Insulator Metal

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Resistive switching in HfO2-based atomic layer deposition grown metal–insulator–metal structures

Applied Surface Science ◽

10.1016/j.apsusc.2014.05.018 ◽

2014 ◽

Vol 312 ◽

pp. 112-116 ◽

Author(s):

Peter Jančovič ◽

Boris Hudec ◽

Edmund Dobročka ◽

Ján Dérer ◽

Ján Fedor ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Resistive Switching ◽

Atomic Layer ◽

Metal Insulator ◽

Metal Structures ◽

Layer Deposition ◽

Metal Insulator Metal

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Precision defect engineering of metal/insulator/metal diodes using atomic layer deposition to localize Ni impurities in Al2O3 tunnel barriers

Journal of Applied Physics ◽

10.1063/5.0045721 ◽

2021 ◽

Vol 129 (14) ◽

pp. 144502

Author(s):

Konner E. K. Holden ◽

Yitong Qi ◽

John F. Conley

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Defect Engineering ◽

Metal Insulator ◽

Layer Deposition ◽

Metal Insulator Metal ◽

Tunnel Barriers

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Influence of precursor chemistry and growth temperature on the electrical properties of SrTiO3-based metal-insulator-metal capacitors grown by atomic layer deposition

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.3525280 ◽

2011 ◽

Vol 29 (1) ◽

pp. 01AC04 ◽

Author(s):

H. García ◽

H. Castán ◽

A. Gómez ◽

S. Dueñas ◽

L. Bailón ◽

...

Keyword(s):

Electrical Properties ◽

Atomic Layer Deposition ◽

Growth Temperature ◽

Atomic Layer ◽

Precursor Chemistry ◽

Metal Insulator ◽

Layer Deposition ◽

Metal Insulator Metal

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Atomic Layer Deposition of High-k and Nanolaminate Dielectrics for Transparent Thin Film Transistors and Metal/Insulator/Metal Tunnel Diodes

ECS Meeting Abstracts ◽

10.1149/ma2011-01/22/1369 ◽

2011 ◽

Keyword(s):

Thin Film ◽

Atomic Layer Deposition ◽

Thin Film Transistors ◽

Atomic Layer ◽

Tunnel Diodes ◽

Metal Insulator ◽

Layer Deposition ◽

High K ◽

Metal Insulator Metal

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Comparative study and characterization of atomic layer deposition Al2O3 films as metal-insulator-metal capacitor dielectric for GaAs hetero-junction bipolar transistor technology

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.5112773 ◽

2019 ◽

Vol 37 (5) ◽

pp. 050903

Author(s):

Jiro Yota ◽

Mehran Janani ◽

Hal M. Banbrook ◽

Patrick Rabinzohn ◽

Markus Bosund

Keyword(s):

Atomic Layer Deposition ◽

Comparative Study ◽

Atomic Layer ◽

Bipolar Transistor ◽

Metal Insulator ◽

Layer Deposition ◽

Metal Insulator Metal ◽

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High-voltage metal-insulator-metal capacitor based on crystalline HfAlOxfilm grown by atomic layer deposition

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.5054848 ◽

2019 ◽

Vol 37 (1) ◽

pp. 011209 ◽

Author(s):

Michael Lisiansky ◽

Inna Popov ◽

Vladimir Uvarov ◽

Valentina Korchnoy ◽

Boris Meyler ◽

...

Keyword(s):

Atomic Layer Deposition ◽

High Voltage ◽

Atomic Layer ◽

Metal Insulator ◽

Layer Deposition ◽

Metal Insulator Metal

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Composition influence on the physical and electrical properties of SrxTi1−xOy-based metal-insulator-metal capacitors prepared by atomic layer deposition using TiN bottom electrodes

Journal of Applied Physics ◽

10.1063/1.3246835 ◽

2009 ◽

Vol 106 (9) ◽

pp. 094101 ◽

Author(s):

N. Menou ◽

M. Popovici ◽

S. Clima ◽

K. Opsomer ◽

W. Polspoel ◽

...

Keyword(s):

Electrical Properties ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Metal Insulator ◽

Layer Deposition ◽

Metal Insulator Metal

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Electrical characteristics and step coverage of ZrO2films deposited by atomic layer deposition for through-silicon via and metal–insulator–metal applications

Japanese Journal of Applied Physics ◽

10.7567/jjap.55.016502 ◽

2015 ◽

Vol 55 (1) ◽

pp. 016502 ◽

Author(s):

Kyeong-Keun Choi ◽

Chan-Gyung Park ◽

Deok-kee Kim

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Electrical Characteristics ◽

Metal Insulator ◽

Through Silicon Via ◽

Step Coverage ◽

Layer Deposition ◽

Metal Insulator Metal

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Atomic layer deposition grown metal-insulator-metal capacitors with RuO2 electrodes and Al-doped rutile TiO2 dielectric layer

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.3534023 ◽

2011 ◽

Vol 29 (1) ◽

pp. 01AC09 ◽

Author(s):

B. Hudec ◽

K. Hušeková ◽

E. Dobročka ◽

J. Aarik ◽

R. Rammula ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Dielectric Layer ◽

Atomic Layer ◽

Metal Insulator ◽

Rutile Tio2 ◽

Layer Deposition ◽

Metal Insulator Metal

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