Numerical investigation of ion energy distribution and ion angle distribution in a dual-frequency capacitively coupled plasma with a hybrid model

2007 ◽  
Vol 14 (11) ◽  
pp. 113501 ◽  
Author(s):  
Shuai Wang ◽  
Xiang Xu ◽  
You-Nian Wang
Keyword(s):  
Energy Distribution ◽  
Numerical Investigation ◽  
Hybrid Model ◽  
Angle Distribution ◽  
Dual Frequency ◽  
Ion Energy ◽  
Capacitively Coupled ◽  
Ion Energy Distribution ◽  
Capacitively Coupled Plasma

A Derivation of Ion Energy Distribution Function for Dual Frequencies Capacitively Coupled Plasma

2014 ◽  
Vol 513-517 ◽  
pp. 4253-4256
Author(s):  
Zhu Wen Zhou ◽  
De Liang Chen ◽  
Bo Kong ◽  
Yuan Sheng Wang
Keyword(s):  
Energy Distribution ◽  
Integrated Circuit ◽  
Theory Model ◽  
Low Frequencies ◽  
Ion Energy ◽  
Capacitively Coupled ◽  
Ion Energy Distribution ◽  
Particle In Cell ◽  
Capacitively Coupled Plasma ◽  
Ion Energy Distributions

A model of ion energy distribution of dual frequencies capacitively coupled plasma (CCP) has been investigated, it is important to analyze these phenomenon and mechanism in order to control the microelectronic processes of integrated circuit and develop the base theories of plasma physics. We focused on the function of the ion energy distributions under high and low frequencies (dual frequencies) drive in capacitive discharges, we derived a theory model of the dual frequencies driven IEDs from analyzing theories. The model can analyze and predict the IEDs under different high and low frequencies driven, which results in accurate multi-peaks IEDs and energy width for the given control parameters, particle-in-cell (PIC) simulations are used to verify this model.

Ion energy distribution control in single and dual frequency capacitive plasma sources

2005 ◽  
Vol 14 (1) ◽  
pp. 89-97 ◽  
Author(s):  
J K Lee ◽  
O V Manuilenko ◽  
N Yu Babaeva ◽  
H C Kim ◽  
J W Shon
Keyword(s):  
Energy Distribution ◽  
Dual Frequency ◽  
Ion Energy ◽  
Plasma Sources ◽  
Ion Energy Distribution

Numerical results for the Ar and CF4 mixture gas in a dual frequency capacitively coupled plasma using a hybrid model

2009 ◽  
Vol 16 (4) ◽  
pp. 043510 ◽  
Author(s):  
Zhen-Hua Bi ◽  
Zhong-Ling Dai ◽  
Xiang Xu ◽  
Zhi-Cheng Li ◽  
You-Nian Wang
Keyword(s):  
Hybrid Model ◽  
Numerical Results ◽  
Dual Frequency ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma
Sign in / Sign up

Export Citation Format

Share Document