Strain measured in a silicon-on-insulator, complementary metal-oxide-semiconductor device channel induced by embedded silicon-carbon source/drain regions

2009 ◽  
Vol 94 (6) ◽  
pp. 063502 ◽  
Author(s):  
Conal E. Murray ◽  
Z. Ren ◽  
A. Ying ◽  
S. M. Polvino ◽  
I. C. Noyan ◽  
...  
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