Reverse current-voltage characteristics of indium tin oxide/silicon solar cells under illumination

1980 ◽  
Vol 51 (4) ◽  
pp. 2164 ◽  
Author(s):  
P. Smith ◽  
R. Singh ◽  
J. DuBow
2014 ◽  
Vol 11 (11-12) ◽  
pp. 1697-1702 ◽  
Author(s):  
Tleuzhan Turmagambetov ◽  
Sébastien Dubois ◽  
Jean-Paul Garandet ◽  
Benoit Martel ◽  
Nicolas Enjalbert ◽  
...  

2001 ◽  
Vol 666 ◽  
Author(s):  
M. K. Jayaraj ◽  
A. D. Draeseke ◽  
J. Tate ◽  
R. L. Hoffman ◽  
J. F. Wager

ABSTRACTTransparent p-n heterojunction diodes are fabricated using p-type CuYO2:Ca and n-type ZnO:Al thin films on a glass substrate coated with indium-tin oxide (ITO). The contact between the n-ZnO:Al / p-CuYO2:Ca heterojunction is found to be rectifying, while the ITO / ZnO:Al contact is ohmic. The typical ratio of forward to reverse current is 15 in the range -3 to 3V. The diode current-voltage characteristics are dominated by the flow of space charge limited current, which is ascribed to the existence of an insulating ZnO interfacial layer. The diode structure has a total thickness of 0.85 μm and an optical transmission of 40%-50% in the visible region.


2015 ◽  
Vol 24 (3) ◽  
pp. 326-339 ◽  
Author(s):  
Milan Padilla ◽  
Christian Reichel ◽  
Nikolaus Hagedorn ◽  
Andreas Fell ◽  
Roman Keding ◽  
...  

2019 ◽  
Vol 7 (5) ◽  
pp. 2192-2199 ◽  
Author(s):  
Deokjae Choi ◽  
Hyun Yoon ◽  
Ka-Hyun Kim ◽  
Han-Don Um ◽  
Kwanyong Seo

Indium Tin Oxide (ITO)-free carrier-selective contact for crystalline silicon solar cells is developed by the integration of a micro-grid electrode.


2011 ◽  
Vol 19 (S3) ◽  
pp. A219 ◽  
Author(s):  
Chia-Hua Chang ◽  
Min-Hsiang Hsu ◽  
Ping-Cheng Tseng ◽  
Peichen Yu ◽  
Wei-Lun Chang ◽  
...  

2011 ◽  
Vol 694 ◽  
pp. 672-675
Author(s):  
Tao Li ◽  
Chun Lan Zhou ◽  
Zhen Gang Liu ◽  
Wen Jing Wang ◽  
Yang Song ◽  
...  

In this paper, the dark current-voltage characteristics of p-n junction of silicon solar cells are analysed, with different nickel film thicknesses of 200nm, 400nm and 600nm. The formation of nickel silicide is obtained after the thermal annealing process for 1min, 5min and 10min. The dark current-voltage curves obtained by three kinds of annealing temperature as a function of time are achieved in experiment. The improvement of series resistance extracted from the dark current-voltage curve in the upper voltage range is observed. The influence of nickel film thicknesses on dark current-voltage characteristics of silicon solar cells is confirmed.


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