Raman scattering measurement of silicon‐on‐insulator substrates formed by high‐dose oxygen‐ion implantation
Keyword(s):
1985 ◽
Vol 43
◽
pp. 300-301
Keyword(s):
Keyword(s):
Keyword(s):
Keyword(s):
1980 ◽
Vol 19
(5)
◽
pp. 1005-1006
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1987 ◽
Vol 134
(8)
◽
pp. 2027-2030
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