Effect of the chemical nature of transition‐metal substrates on chemical‐vapor deposition of diamond

1993 ◽  
Vol 74 (6) ◽  
pp. 4168-4173 ◽  
Author(s):  
X. Chen ◽  
J. Narayan
Keyword(s):  
Chemical Vapor Deposition ◽  
Transition Metal ◽  
Vapor Deposition ◽  
Chemical Nature ◽  
Chemical Vapor ◽  
Metal Substrates

scholarly journals Chemical vapor deposition of TiN on transition metal substrates

2018 ◽  
Vol 334 ◽  
pp. 373-383 ◽  
Author(s):  
L. von Fieandt ◽  
T. Larsson ◽  
E. Lindahl ◽  
O. Bäcke ◽  
M. Boman
Keyword(s):  
Chemical Vapor Deposition ◽  
Transition Metal ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Metal Substrates

scholarly journals Roles of Transition Metal Substrates in Graphene Chemical Vapor Deposition Growth

2020 ◽  
Vol 0 (0) ◽  
pp. 2012006-0
Author(s):  
Ting Cheng ◽  
Luzhao Sun ◽  
Zhirong Liu ◽  
Feng Ding ◽  
Zhongfan Liu
Keyword(s):  
Chemical Vapor Deposition ◽  
Transition Metal ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Growth ◽  
Metal Substrates

Chemical Vapor Deposition of Binary Metal Germanides

1990 ◽  
Vol 187 ◽  
Author(s):  
M.J. Hampden-Smith ◽  
J. Garvey ◽  
D. Lei ◽  
J.C. Huffman
Keyword(s):  
Thermal Decomposition ◽  
Grain Size ◽  
Chemical Vapor Deposition ◽  
Transition Metal ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Solution Model ◽  
Binary Metal ◽  
Decomposition Experiments

AbstractA series of transition metal substituted germacyclopent-3-ene compounds containing transition metal-germanium bonds have been prepared with supporting ligands which are designed to be easily removed either thermally or photochemically. In solution, model thermal decomposition experiments show that either the geramanium or the transition metal substituents may be removed, depending on the nature of the metal. Preliminary hot-wall CVD experiments using manganese and cobalt derivatives result in films with small grain size.

scholarly journals Sequential bottom-up and top-down processing for the synthesis of transition metal dichalcogenide nanosheets: the case of rhenium disulfide (ReS2)

2016 ◽  
Vol 52 (50) ◽  
pp. 7878-7881 ◽  
Author(s):  
Naktal Al-Dulaimi ◽  
Edward A. Lewis ◽  
David J. Lewis ◽  
Simon K. Howell ◽  
Sarah J. Haigh ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Liquid Phase ◽  
Transition Metal ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Transition Metal Dichalcogenide ◽  
Top Down ◽  
Bottom Up ◽  
Liquid Phase Exfoliation ◽  
Methyl Pyrrolidone

Bottom-up (aerosol-assisted chemical vapor deposition, AACVD) and top-down (liquid phase exfoliation, LPE) processing methodologies are used in tandem to produce colloids of few-layer thick rhenium disulfide (ReS2) in N-methyl pyrrolidone.

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