Room temperature photoluminescence of high density (In,Ga)As/GaP quantum dots

2011 ◽  
Vol 99 (14) ◽  
pp. 143123 ◽  
Author(s):  
T. Nguyen Thanh ◽  
C. Robert ◽  
C. Cornet ◽  
M. Perrin ◽  
J. M. Jancu ◽  
...  
Luminescence ◽  
2019 ◽  
Vol 34 (3) ◽  
pp. 387-390
Author(s):  
Ha‐Sung Kong ◽  
Byoung‐Ju Kim ◽  
Kwang‐Sun Kang

2003 ◽  
Vol 83 (21) ◽  
pp. 4300-4302 ◽  
Author(s):  
W. Lu ◽  
Y. L. Ji ◽  
G. B. Chen ◽  
N. Y. Tang ◽  
X. S. Chen ◽  
...  

2007 ◽  
Vol 46 (No. 34) ◽  
pp. L801-L803
Author(s):  
Seiji Nagahara ◽  
Masahiko Shimoda ◽  
Shiro Tsukamoto ◽  
Yasuhiko Arakawa

2002 ◽  
Vol 28 (11) ◽  
pp. 964-966 ◽  
Author(s):  
V. A. Odnoblyudov ◽  
A. Yu. Egorov ◽  
N. V. Kryzhanovskaya ◽  
A. G. Gladyshev ◽  
V. V. Mamutin ◽  
...  

2003 ◽  
Vol 798 ◽  
Author(s):  
Jeong-Sik Lee ◽  
Satoru Tanaka ◽  
Peter Ramvall ◽  
Hiroaki Okagawa

ABSTRACTThe fabrication and evaluation of a UV light-emitting diode (LED) incorporating GaN quantum dots as the active layer is demonstrated. The GaN quantum dots were fabricated on an AlxGa1-xN (x∼0.1) surface using Si as an antisurfactant. Exposing the AlxGa1-xN surface to the Si antisurfactant prior to GaN growth enabled the formation of quantum dots on a surface where growth by the Stranski-Krastanov mode would not be possible. A fairly high density of dots (1010-1011 cm-2) with controllable dot sizes was achieved. Room temperature luminescence at 360 nm was clearly observed during current injection (cw) into an LED structure including the GaN quantum dots. The origin of the electroluminescence is discussed by comparing it to photoluminescence measurements.


2021 ◽  
pp. 152249
Author(s):  
Lu Zhang ◽  
Haiyang Hong ◽  
Kun Qian ◽  
Songsong Wu ◽  
Guangyang Lin ◽  
...  

2003 ◽  
Vol 775 ◽  
Author(s):  
K.F. Huang ◽  
T.P. Hsieh ◽  
N.T. Yeh ◽  
W.J. Ho ◽  
J.I. Chyi ◽  
...  

AbstractSystematic studies of the growth temperature and growth rate effect of the formation of InAs/GaAs quantum dots (QDs) have been demonstrated. These QDs are formed with large InAs coverage (3.0 MLs) and periodic growth interruption via Strnski-Krastonov (S-K) epitaxial growth mode by using metalorganic chemical vapor deposition (MOCVD). The room temperature photoluminescence (PL) spectra show red-shift of peak wavelength by decreasing the InAs growth temperature from 540°C to 500°C. As growth rate increases from 0.05 ML/s to 0.2 ML/s at growth temperature of 500°C, PL linewidth could be narrowed and emission intensity could be increased. These results could be correlated to the In clusters and uniformity of InAs/GaAs QDs observed by scanning electron microscopy (SEM) image. Finally, the room temperature photoluminescence spectra of InAs/GaAs QDs directly capped with GaAs shows peak wavelength of 1.35 μm with narrow linewidth of 30.8 meV is obtained.


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