Measurement of high frequency conductivity of oxide-doped anti-ferromagnetic thin film with a near-field scanning microwave microscope

A near-field scanning microwave microscope (NSMM) is used to study the physical properties of DNA strands with a specific sequence and image lamda-DNA bundles. After the hybridization process between target and capture sequences, specific DNA binding events leads to microwave reflection coefficient (S11) changes of the NSMM. These changes are caused by a modification of the physical dielectric constant due to sequence specific DNA binding. This study demonstrates significant potential of the NSMM as a nondestructive and noncontact tool to detect DNA strands without a target-probe amplification process and as a valuable technique to understand the physical property of DNA.

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Atomic-force-microscope-compatible near-field scanning microwave microscope with separated excitation and sensing probes

Review of Scientific Instruments ◽

10.1063/1.2746768 ◽

2007 ◽

Vol 78 (6) ◽

pp. 063702 ◽

Cited By ~ 86

Author(s):

K. Lai ◽

M. B. Ji ◽

N. Leindecker ◽

M. A. Kelly ◽

Z. X. Shen

Keyword(s):

Atomic Force Microscope ◽

Near Field ◽

Atomic Force ◽

Microwave Microscope ◽

Near Field Scanning

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Near-field scanning optical microscopy studies of thin film surfaces and interfaces

Applied Surface Science ◽

10.1016/j.apsusc.2007.10.092 ◽

2008 ◽

Vol 254 (12) ◽

pp. 3681-3684 ◽

Cited By ~ 4

Author(s):

Petr Klapetek ◽

Jiří Buršík

Keyword(s):

Thin Film ◽

Optical Microscopy ◽

Near Field ◽

Surfaces And Interfaces ◽

Scanning Optical Microscopy ◽

Near Field Scanning

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Improving images from a near-field scanning microwave microscope using a hybrid probe

Applied Physics Letters ◽

10.1063/1.1595134 ◽

2003 ◽

Vol 83 (5) ◽

pp. 1026-1028 ◽

Cited By ~ 22

Author(s):

Jooyoung Kim ◽

Myungsick Kim ◽

Hyun Kim ◽

Doohee Song ◽

Kiejin Lee ◽

...

Keyword(s):

Near Field ◽

Microwave Microscope ◽

Near Field Scanning

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Improved near-field scanning microwave microscope combined with electrical transport measurement for characterizing nonuniformity of electrical dissipation in YBa2Cu3O7−δ films of variable thickness

Journal of Applied Physics ◽

10.1063/1.3259372 ◽

2010 ◽

Vol 107 (4) ◽

pp. 043905 ◽

Cited By ~ 2

Author(s):

Jonathan R. Dizon ◽

Xiang Wang ◽

Judy Z. Wu

Keyword(s):

Variable Thickness ◽

Electrical Transport ◽

Near Field ◽

Transport Measurement ◽

Microwave Microscope ◽

Near Field Scanning

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Investigation of local light scattering properties of thin-film silicon solar cells with subwavelength resolution

MRS Proceedings ◽

10.1557/opl.2011.935 ◽

2011 ◽

Vol 1321 ◽

Author(s):

K. Bittkau ◽

A. Hoffmann ◽

J. Owen ◽

R. Carius

Keyword(s):

Thin Film ◽

Light Trapping ◽

Scattered Light ◽

Near Field ◽

Continuous Transition ◽

Thin Film Silicon ◽

Wavelength Resolution ◽

Scanning Optical Microscopy ◽

Near Field Scanning ◽

High Pass

ABSTRACTIn order to obtain efficient light trapping within a thin-film silicon solar cell, randomly textured interfaces are used. The texture can be introduced by wet-chemical etching in diluted hyrdofluoric acid (HF). By varying of the HF concentration, a continuous transition to smaller surface structures can be achieved. Near-field scanning optical microscopy is applied to measure scattered light with sub-wavelength resolution. On those different surfaces, using Fourier high-pass filters on the measured near-field images, surface features with a high light trapping potential are identified. Finally, criteria for optimized scattering surfaces are obtained.

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