Diversity of electronic transitions and photoluminescence properties of p-type cuprous oxide films: A temperature-dependent spectral transmittance study

2015 ◽  
Vol 117 (4) ◽  
pp. 045701 ◽  
2013 ◽  
Vol 285 ◽  
pp. 373-379 ◽  
Author(s):  
Jung-Dae Kwon ◽  
Se-Hun Kwon ◽  
Tae-Hoon Jung ◽  
Kee-Seok Nam ◽  
Kwun-Bum Chung ◽  
...  

1996 ◽  
Vol 420 ◽  
Author(s):  
M. J. Estes ◽  
L. R. Hirsch ◽  
S. Wichart ◽  
G. Moddel

AbstractWe report on the influence of doping, temperature, porosity, and bandgap on the visible photoluminescence properties of anodically-etched porous a-Si:H and a-Si:C:H thin films. Only boron-doped, p-type a-Si:H or a-Si:C:H samples exhibited any visible photoluminescence. We see evidence of discrete defect or impurity levels in temperature-dependent luminescence measurements. Unlike in porous crystalline silicon, we see no correlation of luminescence energy with porosity. We do, though, observe a correlation of luminescence energy with bandgap of the starting a-Si:C:H films. We discuss the implications of these observations on the nature of the luminescence mechanism.


Carbon ◽  
2011 ◽  
Vol 49 (8) ◽  
pp. 2659-2664 ◽  
Author(s):  
Jung Joon Yoo ◽  
Jin Yu ◽  
Jae Yong Song ◽  
Yeonjin Yi

2010 ◽  
Vol 94 (10) ◽  
pp. 1741-1746 ◽  
Author(s):  
Ziquing Duan ◽  
Nathalie Pereira ◽  
Yicheng Lu ◽  
Aurelien Du Pasquier

1996 ◽  
Vol 288 (1-2) ◽  
pp. 69-75 ◽  
Author(s):  
A.E. Rakhshani ◽  
Y. Makdisi ◽  
X. Mathew

1987 ◽  
Vol 106 ◽  
Author(s):  
Mark S. Rodder ◽  
Dimitri A. Antoniadis

ABSTRACTIt is shown that the grain boundary (GB) in polycrystalline-silicon (poly-Si) films need not be modeled as a temperature-dependent potential barrier or as an amorphous region to explain the temperature (T) dependence of resistivity (ρ) in p-type poly-Si films at low T. Specifically, we consider that QB defect states allow for the tunneling component of current to occur by a two-step process. Incorporation of the two-step process in a numerical calculation of ρ vs. T results in excellent agreement with available data from 100 K to 300 K.


1999 ◽  
Vol 607 ◽  
Author(s):  
S. Kato ◽  
T. Horikoshi ◽  
T. Ohkubo ◽  
T. Iida ◽  
Y. Takano

AbstractThe bulk crystal of silicon germanium was grown by vertical Bridgman method with germanium composition, x, varying from 0.6 to 1.0. The temperature dependent variation of the mobility is indicative of alloy scattering dominantly for the bulk wafer. Phosphorus was diffused in as-grown p-type bulk wafer at 850 °C to form pn-junction, and the diffusion coefficient of phosphorus was evaluated as a function of x. The diffusion behavior of phosphorus in silicon germanium is closely correlated with the germanium self-diffusion with changing x. For specimens with lower content x, P concentration profiles indicated “kink and tail” shape, while it was not observed for higher x. For current-voltage characteristics measurement, an ideality factor was obtained.


Sign in / Sign up

Export Citation Format

Share Document