Erratum: “On the location and stability of charge in SiO2/SiNx dielectric double layers used for silicon surface passivation” [J. Appl. Phys. 115, 144105 (2014)]
2015 ◽
Vol 357
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pp. 635-642
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2007 ◽
Vol 91
(2-3)
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pp. 174-179
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2015 ◽
Vol 54
(4)
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pp. 041402
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