scholarly journals Erratum: “On the location and stability of charge in SiO2/SiNx dielectric double layers used for silicon surface passivation” [J. Appl. Phys. 115, 144105 (2014)]

2015 ◽  
Vol 117 (12) ◽  
pp. 129901 ◽  
Author(s):  
Ruy S. Bonilla ◽  
Christian Reichel ◽  
Martin Hermle ◽  
Peter R. Wilshaw
2014 ◽  
Vol 115 (14) ◽  
pp. 144105 ◽  
Author(s):  
Ruy S. Bonilla ◽  
Christian Reichel ◽  
Martin Hermle ◽  
Peter R. Wilshaw

2016 ◽  
Vol 92 ◽  
pp. 317-325 ◽  
Author(s):  
Lachlan E. Black ◽  
Thomas Allen ◽  
Keith R. McIntosh ◽  
Andres Cuévas

2015 ◽  
Vol 357 ◽  
pp. 635-642 ◽  
Author(s):  
Jhuma Gope ◽  
Vandana ◽  
Neha Batra ◽  
Jagannath Panigrahi ◽  
Rajbir Singh ◽  
...  

2011 ◽  
Vol 8 ◽  
pp. 681-687 ◽  
Author(s):  
Päivikki Repo ◽  
Heli Talvitie ◽  
Shuo Li ◽  
Jarmo Skarp ◽  
Hele Savin

2011 ◽  
Vol 99 (20) ◽  
pp. 203503 ◽  
Author(s):  
Jan-Willem A. Schüttauf ◽  
Karine H. M. van der Werf ◽  
Inge M. Kielen ◽  
Wilfried G. J. H. M. van Sark ◽  
Jatindra K. Rath ◽  
...  

2019 ◽  
Vol 125 (10) ◽  
pp. 105305 ◽  
Author(s):  
B. W. H. van de Loo ◽  
B. Macco ◽  
J. Melskens ◽  
W. Beyer ◽  
W. M. M. Kessels

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