Defining a parameter of plasma-enhanced CVD to characterize the effect of silicon-surface passivation in heterojunction solar cells

2015 ◽  
Vol 54 (4) ◽  
pp. 041402 ◽  
Author(s):  
Wanwu Guo ◽  
Liping Zhang ◽  
Jian Bao ◽  
Fanying Meng ◽  
Jinning Liu ◽  
...  
Keyword(s):  
Solar Cells ◽  
Silicon Surface ◽  
Surface Passivation ◽  
Heterojunction Solar Cells ◽  
Plasma Enhanced Cvd ◽  
Silicon Surface Passivation

scholarly journals Sensing amorphous/crystalline silicon surface passivation by attenuated total reflection infrared spectroscopy of amorphous silicon on glass -=SUP=-*-=/SUP=-

2019 ◽  
Vol 53 (8) ◽  
pp. 1140
Author(s):  
S.N. Abolmasov ◽  
A.S. Abramov ◽  
A.V. Semenov ◽  
I.S. Shakhray ◽  
E.I. Terukov ◽  
...  
Keyword(s):  
Solar Cells ◽  
Amorphous Silicon ◽  
Silicon Surface ◽  
Surface Passivation ◽  
Crystalline Silicon ◽  
Total Reflection ◽  
Effective Lifetime ◽  
Heterojunction Solar Cells ◽  
Silicon Surface Passivation ◽  
Silicon Heterojunction Solar Cells

AbstractAttenuated total reflection Fourier transform infrared (ATR FTIR) spectroscopy and effective lifetime measurements have been used to characterize amorphous/crystalline silicon surface passivation in silicon heterojunction solar cells. The comparative studies show a strong link between microstructure factor R * and effective lifetime of amorphous silicon ( a -Si:H) passivation layers incorporating an interface buffer layer, which prevents the epitaxial growth. It is demonstrated that thin a -Si:H films deposited on glass can be used as ATR substrates in this case. The obtained results show that a -Si:H films with R * close to 0.1 are required for manufacturing of high-efficiency (>23%) silicon heterojunction solar cells.

scholarly journals Improved Silicon Surface Passivation of APCVD Al2O3 by Rapid Thermal Annealing

2016 ◽  
Vol 92 ◽  
pp. 317-325 ◽  
Author(s):  
Lachlan E. Black ◽  
Thomas Allen ◽  
Keith R. McIntosh ◽  
Andres Cuévas
Keyword(s):  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Silicon Surface ◽  
Surface Passivation ◽  
Silicon Surface Passivation

Silicon surface passivation using thin HfO2 films by atomic layer deposition

2015 ◽  
Vol 357 ◽  
pp. 635-642 ◽  
Author(s):  
Jhuma Gope ◽  
Vandana ◽  
Neha Batra ◽  
Jagannath Panigrahi ◽  
Rajbir Singh ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Silicon Surface ◽  
Surface Passivation ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Silicon Surface Passivation
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