Surface state density distribution at an Al2O3‐InP metal‐insulator‐semiconductor field‐effect transistor measured by the charge pumping technique

1986 ◽  
Vol 49 (6) ◽  
pp. 351-353 ◽  
Author(s):  
Takeshi Kobayashi ◽  
Tohru Ichikawa ◽  
Tetsurou Sawai
2001 ◽  
Vol 16 (12) ◽  
pp. 997-1001 ◽  
Author(s):  
Kun-Wei Lin ◽  
Chin-Chuan Cheng ◽  
Shiou-Ying Cheng ◽  
Kuo-Hui Yu ◽  
Chih-Kai Wang ◽  
...  

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