Plasma parameters in very high frequency argon plasmas mixed with nitrogen at atmospheric pressure

Journal of Applied Physics ◽

10.1063/5.0047057 ◽

2021 ◽

Vol 129 (17) ◽

pp. 173302

Author(s):

Kiyoshi Yasutake ◽

Kazushi Yoshida ◽

Hiromasa Ohmi ◽

Hiroaki Kakiuchi

Keyword(s):

Atmospheric Pressure ◽

High Frequency ◽

Plasma Parameters ◽

Very High Frequency ◽

Argon Plasmas ◽

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Plasma parameters in very high frequency helium and argon plasmas at atmospheric pressure

Journal of Applied Physics ◽

10.1063/5.0010195 ◽

2020 ◽

Vol 128 (13) ◽

pp. 133303

Author(s):

Kazushi Yoshida ◽

Ken Nitta ◽

Hiromasa Ohmi ◽

Kiyoshi Yasutake ◽

Hiroaki Kakiuchi

Keyword(s):

Atmospheric Pressure ◽

High Frequency ◽

Plasma Parameters ◽

Very High Frequency ◽

Argon Plasmas ◽

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Characterization of High-Rate Deposited Microcrystalline Si Films Prepared Using Atmospheric-Pressure Very High Frequency Plasma

ECS Meeting Abstracts ◽

10.1149/ma2009-02/34/2510 ◽

2009 ◽

Keyword(s):

Atmospheric Pressure ◽

High Frequency ◽

High Rate ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Si Films ◽

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Characterization of Si and SiOxfilms deposited in very high-frequency excited atmospheric-pressure plasma and their application to bottom-gate thin film transistors

physica status solidi (a) ◽

10.1002/pssa.201532328 ◽

2015 ◽

Vol 212 (7) ◽

pp. 1571-1577 ◽

Author(s):

Hiroaki Kakiuchi ◽

Hiromasa Ohmi ◽

Takahiro Yamada ◽

Shogo Tamaki ◽

Takayuki Sakaguchi ◽

...

Keyword(s):

Thin Film ◽

Atmospheric Pressure ◽

High Frequency ◽

Thin Film Transistors ◽

Atmospheric Pressure Plasma ◽

Very High Frequency ◽

Pressure Plasma ◽

Very High ◽

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Rapid Recrystallization of Amorphous Silicon Utilizing Very-High-Frequency Microplasma Jet at Atmospheric Pressure

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.8484 ◽

2006 ◽

Vol 45 (10B) ◽

pp. 8484-8487 ◽

Author(s):

Mina Ryo ◽

Yusuke Sakurai ◽

Tomohiro Kobayashi ◽

Hajime Shirai

Keyword(s):

Amorphous Silicon ◽

Atmospheric Pressure ◽

High Frequency ◽

Very High Frequency ◽

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High-Rate Deposition of Intrinsic Amorphous Silicon Layers for Solar Cells using Very High Frequency Plasma at Atmospheric Pressure

10.7567/ssdm.2005.p8-4 ◽

2005 ◽

Author(s):

Hiroaki Kakiuchi ◽

Hiromasa Ohmi ◽

Yasuhito Kuwahara ◽

Mitsuhiro Matsumoto ◽

Yusuke Ebata ◽

...

Keyword(s):

Solar Cells ◽

Amorphous Silicon ◽

Atmospheric Pressure ◽

High Frequency ◽

High Rate ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

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Controllability of structural and electrical properties of silicon films grown in atmospheric-pressure very high-frequency plasma

Journal of Physics D Applied Physics ◽

10.1088/1361-6463/aad47c ◽

2018 ◽

Vol 51 (35) ◽

pp. 355203 ◽

Author(s):

Hiroaki Kakiuchi ◽

Hiromasa Ohmi ◽

Kiyoshi Yasutake

Keyword(s):

Electrical Properties ◽

Atmospheric Pressure ◽

High Frequency ◽

Silicon Films ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Structural And Electrical Properties ◽

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Highly efficient formation process for functional silicon oxide layers at low temperatures (≤ 120 °C) using very high-frequency plasma under atmospheric pressure

Precision Engineering ◽

10.1016/j.precisioneng.2019.07.017 ◽

2019 ◽

Vol 60 ◽

pp. 265-273

Author(s):

Hiroaki Kakiuchi ◽

Hiromasa Ohmi ◽

Kiyoshi Yasutake

Keyword(s):

Formation Process ◽

Atmospheric Pressure ◽

High Frequency ◽

Low Temperatures ◽

Silicon Oxide ◽

Very High Frequency ◽

Oxide Layers ◽

High Frequency Plasma ◽

Frequency Plasma ◽

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Characterization of High-Rate Deposited Microcrystalline Si Films Prepared using Atmospheric-Pressure Very High-Frequency Plasma

ECS Transactions ◽

10.1149/1.3207619 ◽

2019 ◽

Vol 25 (8) ◽

pp. 405-412

Author(s):

Keita Tabuchi ◽

Kentato Ouchi ◽

Hiromasa Ohmi ◽

Hiroaki Kakiuchi ◽

Kiyoshi Yasutake

Keyword(s):

Atmospheric Pressure ◽

High Frequency ◽

High Rate ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

Si Films ◽

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High-Rate Deposition of Intrinsic Amorphous Silicon Layers for Solar Cells Using Very High Frequency Plasma at Atmospheric Pressure

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.3587 ◽

2006 ◽

Vol 45 (4B) ◽

pp. 3587-3591 ◽

Author(s):

Hiroaki Kakiuchi ◽

Hiromasa Ohmi ◽

Yasuhito Kuwahara ◽

Mitsuhiro Matsumoto ◽

Yusuke Ebata ◽

...

Keyword(s):

Solar Cells ◽

Amorphous Silicon ◽

Atmospheric Pressure ◽

High Frequency ◽

High Rate ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

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Room-Temperature Silicon Nitrides Prepared with Very High Rates (>50 nm/s) in Atmospheric-Pressure Very High-Frequency Plasma

Plasma Chemistry and Plasma Processing ◽

10.1007/s11090-010-9242-7 ◽

2010 ◽

Vol 30 (5) ◽

pp. 579-590 ◽

Author(s):

Hiroaki Kakiuchi ◽

Hiromasa Ohmi ◽

Kei Nakamura ◽

Yoshihito Yamaguchi ◽

Kiyoshi Yasutake

Keyword(s):

Atmospheric Pressure ◽

High Frequency ◽

Room Temperature ◽

Silicon Nitrides ◽

Very High Frequency ◽

High Frequency Plasma ◽

Frequency Plasma ◽

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